1,2-dimethylnaphtho<2,1-b>tiophene | 69736-22-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 萘
• 英文名称: 1,2-dimethylnaphtho<2,1-b>tiophene
• 英文别名: 1,2-dimethylnaphtho[2,1-b]thiophene；1,2-dimethyl-naphtho[2,1-b]thiophene；1,2-Dimethyl-naphtho[2,1-b]thiophen；1,2-Dimethyl-naphtho<2,1-b>thiophen；1,2-Dimethyl-naphtho<2.1-b>thiophen；1,2-dimethylbenzo[e][1]benzothiole
• CAS: 69736-22-7
• 化学式: C₁₄H₁₂S
• 分子量: 212.315
• InChiKey: IMEBVNIJXHLFQG-UHFFFAOYSA-N

物化性质

• 熔点：
  106-107 °C
• 沸点：
  200 °C(Press: 0.03 Torr)
• 密度：
  1.181±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  5
• 重原子数：
  15
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.14
• 拓扑面积：
  28.2
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  1,2-dimethylnaphtho<2,1-b>tiophene 在 乙醇 、 镍 作用下， 生成 2-(1-naphthyl)butane
  参考文献：
  名称：

  Werner, Recueil des Travaux Chimiques des Pays-Bas, 1949, vol. 68, p. 509,515, 516

  摘要：

  DOI：
• 作为产物：
  描述：

  1,2-dimethyl-2,3a,4,5-tetrahydrobenzo[e][1]benzothiole 在 2,3-二氯-5,6-二氰基-1,4-苯醌 作用下， 生成 1,2-dimethylnaphtho<2,1-b>tiophene
  参考文献：
  名称：

  由二酮硫醚一般合成2,5-二氢噻吩（3-噻吩）

  摘要：

  通过低价钛试剂[由氯化钛（IV）和锌粉制备]容易获得的二酮硫醚的分子内还原偶联反应可提供有效的2,5-二氢噻吩的一般合成方法。

  DOI：

  10.1016/s0040-4039(00)98357-6

文献信息

• One-Pot Synthesis Using the Supported Reagent System Na₂CO₃/SiO₂-PPA/SiO₂: Synthesis of Benzo[<i>b</i>]thiophenes and Naphthothiophenes
  作者：Tadashi Aoyama、Mami Orito、Toshio Takido、Mitsuo Kodomari

  DOI：10.1055/s-2008-1067105

  日期：——

  method has been developed for the synthesis of benzo[ B]thiophenes and naphtho[2,1- B]thiophenes from arenethiols and α-halo ketones using Na 2 CO 3 /SiO 2 -PPA/SiO 2 . Reaction of α-halo ketones with arenethiols is promoted by Na 2 CO 3 /SiO 2 to afford α-sulfanyl ketones, which cyclize in the presence of PPA/SiO 2 to give the corresponding thiophene-fused arenes in one-pot. The reaction using α-bromo acetals

  开发了一种简单有效的方法，用于使用 Na 2 CO 3 /SiO 2 -PPA/SiO 2 从芳硫醇和α-卤代酮合成苯并[B]噻吩和萘并[2,1-B]噻吩。Na 2 CO 3 /SiO 2 促进α-卤代酮与芳烃硫醇反应生成α-硫烷基酮，在PPA/SiO 2 存在下环化生成相应的噻吩稠合芳烃一锅法。使用α-溴缩醛代替α-卤代酮的反应也通过一锅三步反应得到相应的萘并[2,1-B]噻吩。
• Integration of a Four-Step Reaction into One-Pot under the Coexistence­ of Silica-Gel-Supported Acid and Base Reagents: Synthesis of Benzo- and Naphthothiophenes Using NaHSO4/SiO2 and Na2CO3/SiO2
  作者：Mamiko Hayakawa、Tadashi Aoyama、Kyohei Nakaoka、Masayuki Kosuge、Akihiko Ouchi

  DOI：10.1055/s-0037-1610866

  日期：2019.6

  reaction proceeded efficiently by introduction of starting materials and reagents in a single reaction vessel. The starting materials were very easy to handle and unpleasant smell of aryl thiols that were used in conventional methods could be avoided. Novel thirty-nine benzo- and naphthothiophenes were synthesized by this method in excellent to fair yields. A four-step synthesis of benzo- and naphthothiophenes

  抽象的 通过硅胶支持的酸和碱试剂NaHSO 4 / SiO 2和Na 2 CO 3 / SiO ，将具有生物学重要性并在材料科学中应用的四步合成苯并噻吩和萘噻吩整合到一锅反应中。2。负载的试剂在不中和的情况下在支持物表面上提供了酸性和碱性环境，并在同一介质中单独工作。该四步反应包括（i）3-卤代2,4-戊二酮的脱乙酰基化为α-卤代酮，（ii）S脱乙酰基-将芳基硫代乙酸酯合成芳硫醇，（iii）将α-卤代酮和芳硫醇偶联以生成α-硫烷基酮，以及（iv）将硫烷基酮环化为苯并噻吩和萘噻吩。步骤（i）和（iii）通过Na 2 CO 3 / SiO 2进行，并且（ii）和（iv）通过NaHSO 4 / SiO 2进行。通过将原料和试剂引入单个反应容器中，四步反应有效地进行了。起始原料非常易于处理，可以避免传统方法中所用芳基硫醇的难闻气味。用这种方法合成了新颖的三十九个苯并噻吩和萘并噻吩，收率极高。 通过硅胶支持的酸和碱试剂NaHSO
• One-Pot Synthesis of Benzo[<i>b</i>]thiophenes and Naphtho[2,1-<i>b</i>]thiophenes in the Presence of Acidic and Basic Supported Reagents
  作者：Tadashi Aoyama、Toshio Takido、Mitsuo Kodomari

  DOI：10.1055/s-2005-918928

  日期：——

  A simple and efficient method has been developed for the synthesis of benzo[b]thiophenes and naphtho[2,1-b]thiophenes from aryl thiols and α-halo ketones by using an acid- and a base-supported reagent system, Na 2 CO 3 /SiO 2 -PPA/SiO 2 . Reaction of α-halo ketones with aryl thiols is promoted by Na 2 CO 3 /SiO 2 to afford α-phenylthio ketones, which cyclizes in the presence of PPA/SiO 2 to give the

  开发了一种简单有效的方法，通过使用酸和碱支持的试剂系统 Na 2 从芳基硫醇和 α-卤代酮合成苯并 [b] 噻吩和萘并 [2,1-b] 噻吩CO 3 /SiO 2 -PPA/SiO 2 。Na 2 CO 3 /SiO 2 促进α-卤代酮与芳基硫醇的反应生成α-苯基硫代酮，在PPA/SiO 2 存在下环化生成相应的芳基噻吩。
• PHOTOACID-GENERATING COMPOUND AND ASSOCIATED POLYMER, PHOTORESIST COMPOSITION, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20180095363A1

  公开（公告）日：2018-04-05

  A photoacid-generating compound has the structure wherein m, n, R 1 , R 2 , X, Y, and Z − are defined herein. The photoacid-generating compound exhibits strong absorption and chemical sensitivity to extreme ultraviolet radiation, while also absorbing longer wavelengths with desirably reduced chemical sensitivity. Also described are a polymer incorporating the residue of a polymerizable version of the photoacid-generating compound, a photoresist composition that includes the photoacid-generating compound, the polymer, or a combination thereof, and a method of forming a photoresist relief image using the photoresist composition.

  一种光酸生成化合物具有结构，其中m、n、R1、R2、X、Y和Z−在此处定义。该光酸生成化合物对极紫外辐射具有强吸收和化学敏感性，同时还吸收较长波长并具有较低的化学敏感性。还描述了一种聚合物，其中包含可聚合版本的光酸生成化合物的残留物，一种包含该光酸生成化合物、聚合物或两者组合的光阻剂组合物，以及使用该光阻剂组合物形成光阻剂
• Photoacid-generating compound and associated polymer, photoresist composition, and method of forming a photoresist relief image
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US10088749B2

  公开（公告）日：2018-10-02

  A photoacid-generating compound has the structure wherein m, n, R1, R2, X, Y, and Z− are defined herein. The photoacid-generating compound exhibits strong absorption and chemical sensitivity to extreme ultraviolet radiation, while also absorbing longer wavelengths with desirably reduced chemical sensitivity. Also described are a polymer incorporating the residue of a polymerizable version of the photoacid-generating compound, a photoresist composition that includes the photoacid-generating compound, the polymer, or a combination thereof, and a method of forming a photoresist relief image using the photoresist composition.

  光酸生成化合物的结构是 其中 m、n、R1、R2、X、Y 和 Z- 在本文中定义。这种光酸生成化合物对极端紫外线辐射具有很强的吸收能力和化学敏感性，同时还能吸收较长波长的辐射，化学敏感性明显降低。此外，还描述了一种包含光酸生成化合物可聚合型残留物的聚合物，一种包含光酸生成化合物、聚合物或其组合的光刻胶组合物，以及一种使用该光刻胶组合物形成光刻胶浮雕图像的方法。