methyl 9H-xanthen-9-yl ether | 18939-90-7

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 苯并吡喃
• 英文名称: methyl 9H-xanthen-9-yl ether
• 英文别名: 9-methoxy-9H-xanthene；Xanthylmethylether；9-Methoxy-xanthen；9-methoxy-xanthene
• CAS: 18939-90-7
• 化学式: C₁₄H₁₂O₂
• 分子量: 212.248
• InChiKey: QFRCVVNEVUAGJC-UHFFFAOYSA-N

物化性质

• 沸点：
  297.8±39.0 °C(Predicted)
• 密度：
  1.20±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.4
• 重原子数：
  16
• 可旋转键数：
  1
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.14
• 拓扑面积：
  18.5
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  methyl 9H-xanthen-9-yl ether 、 (4S)-4-isopropyl-3-(1-oxopropyl)-1,3-thiazolidine-2-thione 在 三乙基硅基三氟甲磺酸酯 、 dichlorobis(trimethylphosphine)nickel 、 2,6-二甲基吡啶 作用下， 以 二氯甲烷 为溶剂， 反应 15.07h， 以95%的产率得到(S)-4-isopropyl-N-[(R)-2-methyl-3-(9H-xanthen-9-yl)propanoyl]-1,3-thiazolidine-2-thione
  参考文献：
  名称：

  Stereoselective Alkylation of (S)-N-Acyl-4-isopropyl-1,3-thiazolidine-2-thiones Catalyzed by (Me₃P)₂NiCl₂

  摘要：

  The structurally simple (Me3P)(2)NiCl2 complex catalyzes S(N)1-type alkylations of chiral N-acyl thiazolidinethiones with diarylmethyl methyl ethers and other stable carbenium cations. The former can contain a variety of functional groups and heteroatoms at the alpha-position. The resultant adducts are isolated as single diastereomers in high yields and can be converted into enantiomerically pure derivatives in a straightforward manner.

  DOI：

  10.1021/acs.orglett.5b01626
• 作为产物：
  描述：

  占吨醇 、 甲醇 在 碘 作用下， 反应 0.08h， 生成 methyl 9H-xanthen-9-yl ether
  参考文献：
  名称：

  无溶剂和高浓度反应条件下碘催化的芳基取代醇的转化

  摘要：

  研究了碘在无溶剂反应条件下（SFRC）和高浓度反应条件（HCRC）下在各种溶剂存在下的醇催化转化反应，以了解这些条件下反应中间体的行为。二聚，脱水和取代是苯甲醇所观察到的三种类型的转化。在伯醇和仲醇的情况下，二聚和取代反应占主导，而在叔醇的情况下，脱水占主导。SFRC在I2催化的二聚反应中，取代的1-苯基乙醇的相对反应性提供了一个良好的Hammett图ρ+ = -2.8（r2 = 0.98），表明存在电子贫化的中间体，且在一定的速率下具有一定程度的发达电荷确定步骤。

  DOI：

  10.17344/acsi.2017.3841

文献信息

• SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOCURABLE COMPOSITION AND CURED BODY THEREOF
  申请人：Suzuki Issei

  公开号：US20110039205A1

  公开（公告）日：2011-02-17

  An object of the present invention is to provide a sulfonium salt that has sufficient photosensitivity by active energy rays, such as visible light, ultraviolet rays, electron beams, and X-rays. The present invention is a sulfonium salt represented by formula (1). It is noted that R 1 is a group represented by formula (2); R 2 and R 3 each represent an aryl group having 6 to 30 carbon atoms, a heterocyclic hydrocarbon group having 4 to 30 carbon atoms, an alkyl group having 1 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, or an alkynyl group having 2 to 30 carbon atoms; X − represents a monovalent polyatomic anion; R 4 to R 6 each represent an alkyl group, or the like; k represents an integer of 0 to 4; m represents an integer of 0 to 3; n represents an integer of 0 to 4; and A represents a group represented by —S—, —O—, —SO—, —SO 2 —, or —CO—.

  本发明的目的是提供一种具有足够光敏度的烷基硫鎓盐，能够通过活性能量射线，如可见光、紫外线、电子束和X射线来激发。本发明是一种由式（1）表示的烷基硫鎓盐。其中，R1是由式（2）表示的基团；R2和R3分别表示具有6至30个碳原子的芳基基团、具有4至30个碳原子的杂环烃基团、具有1至30个碳原子的烷基基团、具有2至30个碳原子的烯基基团或具有2至30个碳原子的炔基基团；X-表示单价多原子阴离子；R4至R6分别表示烷基基团或类似物；k表示0至4的整数；m表示0至3的整数；n表示0至4的整数；A表示由—S—、—O—、—SO—、—SO2—或—CO—表示的基团。
• PHOSPHONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION
  申请人：San-Apro Limited

  公开号：EP2284165A1

  公开（公告）日：2011-02-16

  An object of the present invention is to provide a sulfonium salt that has sufficient photosensitivity by active energy rays, such as visible light, ultraviolet rays, electron beams, and X-rays. The present invention is a sulfonium salt represented by formula (1). It is noted that R1 is a group represented by formula (2); R2 and R3 each represent an aryl group having 6 to 30 carbon atoms, a heterocyclic hydrocarbon group having 4 to 30 carbon atoms, an alkyl group having 1 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, or an alkynyl group having 2 to 30 carbon atoms; X- represents a monovalent polyatomic anion; R4 to R6 each represent an alkyl group, or the like; k represents an integer of 0 to 4; m represents an integer of 0 to 3; n represents an integer of 0 to 4; and A represents a group represented by -S-, -O-, -SO-, -SO2-, or -CO-.

  本发明的目的是提供一种锍盐，该锍盐对可见光、紫外线、电子束和 X 射线等活性能量射线具有足够的光敏性。本发明是一种由式（1）表示的锍盐。值得注意的是，R1 是式 (2) 所代表的基团；R2 和 R3 分别代表具有 6 至 30 个碳原子的芳基、具有 4 至 30 个碳原子的杂环烃基、具有 1 至 30 个碳原子的烷基、具有 2 至 30 个碳原子的烯基或具有 2 至 30 个碳原子的炔基；X- 代表一价多原子阴离子；R4 至 R6 分别代表烷基或类似物；k 代表 0 至 4 的整数；m 代表 0 至 3 的整数；n 代表 0 至 4 的整数；以及 A 代表由 -S-、-O-、-SO-、-SO2- 或 -CO- 所代表的基团。
• SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION AND RESIST COMPOSITION
  申请人：San-Apro Ltd.

  公开号：EP3909943A1

  公开（公告）日：2021-11-17

  Provided are a novel sulfonium salt having high photosensitivity to g-rays or h-rays; a novel photoacid generator containing a sulfonium salt that has high photosensitivity to g-rays or h-rays, has high solubility in solvents and cationically polymerizable compounds such as epoxy compounds, and has an excellent storage stability in compositions containing the cationically polymerizable compounds; and the like. The present invention relates to a sulfonium salt represented by the formula (1), a photoacid generator containing the sulfonium salt, and the like.

  本发明提供了一种对 g 射线或 h 射线具有高光敏性的新型锍盐；一种含有对 g 射线或 h 射线具有高光敏性的锍盐的新型光酸发生器，该锍盐在溶剂和阳离子可聚合化合物（如环氧化合物）中具有高溶解性，并且在含有阳离子可聚合化合物的组合物中具有优异的储存稳定性；以及类似物质。本发明涉及由式（1）表示的锍盐、含有该锍盐的光酸发生器等。
• 10.1002/anie.202405449
  作者：Guo, Ping、Song, Xuedong、Huang, Banruo、Zhang, Ruixue、Zhao, Jie

  DOI：10.1002/anie.202405449

  日期：——

  Photoinduced zirconocene catalysis was utilized to achieve the reductive coupling of ethers with remarkable activity and cross-selectivity. Mechanistic investigation revealed that photoexcitation of low-valent zirconocene facilitates the scission of benzylic C(sp3)−O bonds, resulting in benzylic radicals that recombine with Zr center. Subsequent carbomagnesiation generates benzylic Grignard reagents

  利用光诱导二茂锆催化实现醚的还原偶联，具有显着的活性和交叉选择性。机理研究表明，低价二茂锆的光激发促进了苄基C( sp3 )−O键的断裂，产生与Zr中心重组的苄基自由基。随后的碳镁化生成苄基格氏试剂，用于下游与脂肪族醚的偶联。
• SULFONIUM SALT, PHOTOACID GENERATOR, PHOTO-CURABLE COMPOSITION, AND CURED PRODUCT OF THE PHOTO-CURABLE COMPOSITION
  申请人：San-Apro Limited

  公开号：EP2284165B1

  公开（公告）日：2013-02-20