申请人:NISSAN CHEMICAL INDUSTRIES, LTD.
公开号:US20150008372A1
公开(公告)日:2015-01-08
A composition for forming an antistatic film, includes: an oligomer compound of Formula (1A):
(where R
1
is a hydrogen atom or a group of Formula (2), each of R
2
and R
3
is independently a hydrogen atom, a group of Formula (3), or a group of Formula (4), at least one of the plurality of Rs is a sulfo group, a and b are positive integers satisfying 2≦(a+b)≦6; and each of a plurality of xs is independently an integer from 0 to 4):
(where n is an integer satisfying 1≦n<(a+b+4); a, b, a plurality of Rs, and x are the same as those in Formula (1A); and each of a plurality of ys is independently an integer from 0 to 5); and water.
一种用于形成抗静电膜的组合物,包括:式(1A)的寡聚物化合物:
(其中R1是氢原子或式(2)的基团,每个R2和R3独立地是氢原子,式(3)的基团或式(4)的基团,多个Rs中至少一个是磺酸基团,a和b是正整数,满足2≦(a+b)≦6;每个xs都是独立的从0到4的整数):
(其中n是整数,满足1≦n <(a+b+4); a,b,多个Rs和x与式(1A)中的相同; 每个ys都是独立的从0到5的整数);和水。