bis(2,4-dimethylphenyl)methanol | 21945-76-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: bis(2,4-dimethylphenyl)methanol
• 英文别名: 2,2',4,4'-Tetramethyl-benzhydrol
• CAS: 21945-76-6
• 化学式: C₁₇H₂₀O
• mdl: MFCD16357326
• 分子量: 240.345
• InChiKey: LKGVDOOHYRKQIQ-UHFFFAOYSA-N

物化性质

• 沸点：
  387.1±11.0 °C(Predicted)
• 密度：
  1.035±0.06 g/cm3(Temp: 20 °C; Press: 760 Torr)(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  4.2
• 重原子数：
  18
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.294
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  bis(2,4-dimethylphenyl)methanol 生成 4,4’-(chloromethylene)bis(1,3-dimethylbenzene)
  参考文献：
  名称：

  Coops et al., Recueil des Travaux Chimiques des Pays-Bas, 1940, vol. 59, p. 1109,1111

  摘要：

  DOI：
• 作为产物：
  描述：

  2,2,4,4-四甲基苯甲酮 在 sodium amalgam 、 乙醇 作用下， 生成 bis(2,4-dimethylphenyl)methanol
  参考文献：
  名称：

  Coops et al., Recueil des Travaux Chimiques des Pays-Bas, 1940, vol. 59, p. 1109,1111

  摘要：

  DOI：

文献信息

• Formylation of Electron-Rich Aromatic Rings Mediated by Dichloromethyl Methyl Ether and TiCl4: Scope and Limitations
  作者：Iván Ramos-Tomillero、Marta Paradís-Bas、Ibério de Pinho Ribeiro Moreira、Josep Bofill、Ernesto Nicolás、Fernando Albericio

  DOI：10.3390/molecules20045409

  日期：——

  Here the aromatic formylation mediated by TiCl4 and dichloromethyl methyl ether previously described by our group has been explored for a wide range of aromatic rings, including phenols, methoxy- and methylbenzenes, as an excellent way to produce aromatic aldehydes. Here we determine that the regioselectivity of this process is highly promoted by the coordination between the atoms present in the aromatic moiety and those in the metal core.

  在这里，我们探索了我们小组之前描述的由TiCl4和二氯甲基甲醚介导的芳香环的甲酰化反应，适用于广泛类型的芳香环，包括酚、甲氧基苯和甲基苯，作为生成芳香醛的一种优秀方法。在此，我们确定该过程的区域选择性高度受到芳香部分中存在的原子与金属核中原子之间的配位作用促进。
• Steric and electronic effects on the oxidation of ortho-substituted benzhydrols by chromic acid
  作者：D.G. Lee、M. Raptis

  DOI：10.1016/s0040-4020(01)83387-1

  日期：1973.1

  A study has been made of the oxidation of a number of substituted benzhydrols by chromic acid in aqueous acetic acid. The reaction rate constants are linearly proportional to the KR+ values of the alcohols. ortho-Substitution increases the rate of reaction and reduces the magnitude of the primary kinetic isotope effect. The major result of steric crowding appears to be an increase in the energy of

  已经研究了乙酸水溶液中铬酸对许多取代的苯酚的氧化作用。反应速率常数与醇的K R +值成线性比例。邻位取代可提高反应速率并降低一级动力学同位素效应的强度。空间拥挤的主要结果似乎是反应物能量的增加，而取代基的主要电子效应是使过渡态稳定或不稳定。
• Direct Syntheses of Diphenylmethanol Derivatives from Substituted Benzenes and CHCl ₃ through Friedel‐Crafts Alkylation and Post‐Synthetic Hydrolysis or Alcoholysis Catalyzed by Alumina
  作者：Guga Suri、Fengying Liang、Mixia Hu、Meiling Wang、Ren Bu、Xiaoying Zhang、Hui Wang、Wenyan Dong、Chaolu Eerdun、Akihiko Tsuda

  DOI：10.1002/open.202200042

  日期：2022.5

  Friedel-Crafts alkylation of methyl-substituted benzenes and CHCl3 and post-synthetic work-up with alumina containing water or a primary alcohol allowed synthesis of diphenylmethanol derivatives and their alkyl ethers. The alumina used in the reaction could be recycled repeatedly through washing with water and drying.

  AlCl 3介导的甲基取代的苯和CHCl 3的弗里德尔-克来福特烷基化以及用含有水或伯醇的氧化铝的合成后处理允许合成二苯甲醇衍生物及其烷基醚。反应中使用的氧化铝经水洗、干燥后可重复循环使用。
• Chemically amplified resist material and resist pattern-forming method
  申请人：JSR CORPORATION

  公开号：US10018911B2

  公开（公告）日：2018-07-10

  A chemically amplified resist material comprises a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The radiation-sensitive acid-and-sensitizer generating agent or the radiation-sensitive acid generating agent included in the generative component comprises the first compound that is radiation-sensitive and second compound that is radiation-sensitive. The first compound includes a first onium cation and a first anion, and the second compound includes a second onium cation and a second anion that is different from the first anion. Each of an energy released upon reduction of the first onium cation to a radical and an energy released upon reduction of the second onium cation to a radical is less than 5.0 eV.

  一种化学放大抗蚀剂材料包括一种在酸的作用下能溶于或不溶于显影液的聚合物成分，以及一种在曝光时能产生辐射敏感敏化剂和酸的生成成分。生成组件中的辐射敏感性酸和敏化剂生成剂或辐射敏感性酸生成剂包括辐射敏感性第一化合物和辐射敏感性第二化合物。第一化合物包括第一鎓阳离子和第一阴离子，第二化合物包括第二鎓阳离子和不同于第一阴离子的第二阴离子。第一鎓阳离子还原成自由基时释放的能量和第二鎓阳离子还原成自由基时释放的能量均小于 5.0 eV。
• Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting
  申请人：TOKYO ELECTRON LIMITED

  公开号：US10025187B2

  公开（公告）日：2018-07-17

  A photosensitization chemical-amplification type resist material according to the present invention is used for a two-stage exposure lithography process, and contains (1) a developable base component and (2) a component generating a photosensitizer and an acid through exposure. Among three components consisting of (a) an acid-photosensitizer generator, (b) a photosensitizer precursor, and (c) a photoacid generator, the above component contains only the component (a), any two components, or all of the components (a) to (c).

  根据本发明，一种光敏化学放大型抗蚀剂材料用于两阶段曝光光刻工艺，它包含(1)可显影碱成分和(2)通过曝光产生光敏剂和酸的成分。在由(a)酸-光敏剂发生器、(b)光敏剂前体和(c)光酸发生器组成的三个组件中，上述组件只包含(a)组件、任意两个组件或(a)至(c)的所有组件。