It Bu ( I t Bu = 1,3-di- tert -butylimidazol-2-ylidene) 代表了有机合成和催化中最重要和最通用的N-烷基 N-杂环卡宾。在此,我们报告了I t Oct (I t Octyl)、C 2 -对称、 I t Bu的高级同系物的合成、结构表征和催化活性。新的配体类别,包括饱和咪唑啉-2-亚基类似物,已与 MilliporeSigma 合作商业化:1 月929 298;SI t Oct , 929 492 使有机和无机合成领域的学术和工业研究人员能够广泛接触。我们证明用t -Oct替换t -Bu 侧链会导致迄今为止报道的N -烷基 N- 杂环卡宾的空间体积最高,同时保留 N- 脂肪族配体固有的电子特性,例如极强的 σ -对N-烷基N-杂环卡宾的反应性至关重要的贡献。咪唑鎓I t Oct和咪唑啉鎓SI t Oct的高效大规模合成介绍了卡宾前体。与 Au(
TITANIUM COMPLEX, PROCESSES FOR PRODUCING THE SAME, TITANIUM-CONTAINING THIN FILM, AND PROCESS FOR PRODUCING THE SAME
申请人:Tada Ken-ichi
公开号:US20120029220A1
公开(公告)日:2012-02-02
A subject for the invention is to provide novel titanium complexes which have a high vapor pressure and high thermal stability and serve as an excellent material for producing a titanium-containing thin film by a technique such as the CVD method or ALD method and to further provide processes for producing these complexes, titanium-containing thin films produced from the complexes, and a process for producing the thin films. The invention relates to producing a titanium complex represented by general formula (1):
(wherein R
1
and R
4
each independently represent an alkyl group having 1-16 carbon atoms; R
2
and R
3
each independently represent a hydrogen atom or an alkyl group having 1-3 carbon atoms; and R
5
represents an alkyl group which has 1-16 carbon atoms and may have been substituted with one or more fluorine atoms) and to producing a titanium-containing thin film using the complex.
A Silyl Radical formed by Muonium Addition to a Silylene
作者:Amitabha Mitra、Jean-Claude Brodovitch、Clemens Krempner、Paul W. Percival、Pooja Vyas、Robert West
DOI:10.1002/anie.201000166
日期:2010.4.6
Muonraker: Irradiation of the stable silylene N,N′‐bis(2,6‐diisopropylphenyl)‐1,3‐diaza‐2‐silacyclopent‐4‐en‐2‐ylidene with muons produced a radical that was identified as the monomeric muonium adduct from its muon spin rotation (μSR) spectrum. The muon hyperfine constant for this radical is 931 MHz, the largest ever recorded for a free radical.