bis(4-chloro-phenyl)-iodonium cation | 46449-60-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: bis(4-chloro-phenyl)-iodonium cation
• 英文别名: 4,4'-Dichlordiphenyljodonium⁺；4,4'-Dichlordiphenyljodonium；Bis(4-chlorphenyl)jodonium；Di-(4-chlorphenyl)jodonium；Bis(4-chlorophenyl)iodanium
• CAS: 46449-60-9
• 化学式: C₁₂H₈Cl₂I
• 分子量: 350.006
• InChiKey: QRMFGEKERJAYSQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.6
• 重原子数：
  15
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

反应信息

• 作为反应物：
  描述：

  bis(4-chloro-phenyl)-iodonium cation 在 汞 作用下， 生成 4-氯苯基氯化汞
  参考文献：
  名称：

  Reutow et al., Doklady Akademii Nauk SSSR, 1953, vol. 122, p. 825

  摘要：

  DOI：

文献信息

• Salt suitable for an acid generator and a chemically amplified resist composition containing the same
  申请人：Yamaguchi Satoshi

  公开号：US20070122750A1

  公开（公告）日：2007-05-31

  The present invention provides a salt of the formula (I): wherein ring X represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, and one or more hydrogen atom in the monocyclic or polycyclic hydrocarbon group is optionally substituted with alkyl group having 1 to 10 carbon atom, alkoxy group having 1 to 10 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 10 carbon atoms or cyano group; Q 1 and Q 2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; and A + represents organic counter ion. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).

  本发明提供了一种公式（I）的盐： 其中，环X代表具有3至30个碳原子的单环或多元环烃基团，并且单环或多元环烃基团中的一个或多个氢原子可被选地取代为具有1至10个碳原子的烷基、具有1至10个碳原子的烷氧基、具有1至4个碳原子的全氟烷基、具有1至10个碳原子的羟基烷基或腈基；Q1和Q2各自独立地代表氟原子或具有1至6个碳原子的全氟烷基；以及A+代表有机反离子。 本发明还提供了一种包含公式（I）的盐的化学放大抗蚀剂组合物。
• SALT, ACID GENERATOR, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20160200702A1

  公开（公告）日：2016-07-14

  A salt represented by the formula (I): wherein R 1 represents a C1 to C12 alkyl group in which a methylene group can be replaced by an oxygen atom or a carbonyl group; Q 1 and Q 2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; A 1 represents a lactone ring-containing group which has 4 to 24 carbon atoms; R 2 represents an acid-labile group; and “m” represents an integer of 0 to 3.

  由公式(I)表示的盐： 其中 R1 代表一个C1至C12的烷基，其中一个亚甲基基团可以被一个氧原子或一个羰基团所取代； Q1 和 Q2 各自独立地代表一个氟原子或一个C1至C6的全氟烷基团； A1 代表一个含有内酯环的基团，该基团有4到24个碳原子； R2 代表一个酸不稳定的基团；并且 “m”代表一个0到3之间的整数。
• Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same
  申请人：Shigematsu Junji

  公开号：US20080086014A1

  公开（公告）日：2008-04-10

  The present invention provides a salt represented by the formula (I): wherein X represents a C3-C30 divalent group containing at least one divalent alicyclic hydrocarbon group, and at least one —CH 2 — in the C3-C30 divalent group may be substituted with —O— or —CO—, Y represents a C3-C30 cyclic hydrocarbon group which may be substituted with at least one group selected from a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group and a cyano group, and at least one —CH 2 — in the C3-C30 cyclic hydrocarbon group may be substituted with —O— or —CO—, Q 1 and Q 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A + represents an organic counter ion.

  本发明提供了一种由公式(I)表示的盐：其中X代表含至少一个二价脂环烃基的C3-C30二价基团，并且C3-C30二价基团中的至少一个—CH2—可以被—O—或—CO—取代，Y代表一个C3-C30环烃基，该环烃基可以至少被选自C1-C6烷氧基、C1-C4全氟烷基、C1-C6羟基烷基、羟基和氰基的至少一个取代基取代，并且C3-C30环烃基中的至少一个—CH2—可以被—O—或—CO—取代，Q1和Q2各自独立地代表一个氟原子或一个C1-C6全氟烷基，以及A+代表一个有机反离子。
• ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20200223796A1

  公开（公告）日：2020-07-16

  A novel onium salt of formula (1) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by photolithography using KrF or ArF excimer laser, EB or EUV, the resist composition has a high sensitivity and reduced acid diffusion and is improved in exposure latitude, MEF, and LWR.

  提供了一种化学增感剂组合物，其中包括式（1）的新型离子盐作为PAG。当使用KrF或ArF准分子激光、EB或EUV进行光刻工艺处理时，该抗蚀组合物具有高灵敏度、减少酸扩散，并在曝光宽度、MEF和LWR方面得到改善。
• [EN] DENTAL COMPOSITION<br/>[FR] COMPOSITION DENTAIRE
  申请人：DENTSPLY DETREY GMBH

  公开号：WO2018108948A1

  公开（公告）日：2018-06-21

  The present invention relates to a dental composition comprising a specific polymerizable compound and a polymerization initiator system. Furthermore, the present invention relates to the specific polymerizable compound as such and its use in a dental composition. The specific polymerizable compound of the present invention has an N-allyl (meth)acrylamide group, which nitrogen atom is substituted with an alkyl or alkenyl group optionally substituted by a group selected from a hydroxyl group, a C1-4 alkoxy group, a tertiary amino group and a carboxyl group, wherein 1 to 8 carbon atoms in the main chain of the alkyl or alkenyl group may independently from each other be replaced by a heteroatom selected from an oxygen atom and a sulfur atom.

  本发明涉及一种包括特定可聚合化合物和聚合引发剂体系的牙科组合物。此外，本发明涉及所述特定可聚合化合物本身及其在牙科组合物中的使用。本发明的特定可聚合化合物具有N-烯丙基（甲基）丙烯酰胺基团，该氮原子被烷基或烯基取代，该烷基或烯基可以选择性地被羟基、C1-4烷氧基、三级胺基和羧基中的一种取代，其中烷基或烯基中的主链的1至8个碳原子可以分别被氧原子和硫原子中选择的杂原子所取代。