申请人:——
公开号:US20020016472A1
公开(公告)日:2002-02-07
Protecting groups derived from a halogenated coumarin group, a quinoline-2-one group, a xanthene group, a thioxanthene group, a selenoxanthene group, or an anthracene group are described. The protecting groups is photolabile and can be removed by irradiating the group with light, such as flash photolysis with ultraviolet radiation or pulsed infrared radiation.
描述了源自卤代香豆素基团、喹啉-2-酮基团、咕吨基团、噻吨基团、硒吨基团或蒽基团的保护基团。这些保护基团对光敏感,可以通过照射该基团的光(如紫外线辐射的闪光光解或脉冲红外辐射)来去除。