chlorophenyldinitromethane | 82815-26-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: chlorophenyldinitromethane
• 英文别名: phenylchlorodinitromethane；(chloro-dinitro-methyl)-benzene；(Chlor-dinitro-methyl)-benzol；Phenyl-chlorodinitromethane；[chloro(dinitro)methyl]benzene
• CAS: 82815-26-7
• 化学式: C₇H₅ClN₂O₄
• 分子量: 216.581
• InChiKey: PFDHBJNLFOINAY-UHFFFAOYSA-N

物化性质

• 沸点：
  92 °C(Press: 1 Torr)
• 密度：
  1.508±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.3
• 重原子数：
  14
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.14
• 拓扑面积：
  91.6
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  chlorophenyldinitromethane 、 水 生成 苯甲酸 、 alkaline earth salt of/the/ methylsulfuric acid
  参考文献：
  名称：

  Ponzio; Charrier, Gazzetta Chimica Italiana, 1908, vol. 38 I, p. 654

  摘要：

  DOI：
• 作为产物：
  描述：

  benzohydroximoyl chloride 在 五氧化二氮 作用下， 以 氯仿 为溶剂， 反应 0.5h， 以69%的产率得到chlorophenyldinitromethane
  参考文献：
  名称：

  New method for preparation of ?-chlorodinitro compounds

  摘要：

  DOI：

  10.1007/bf00956001

文献信息

• The nitro anomaly and Br�nsted ?nuc values inSN2 reactions on chlorine
  作者：Linoam Eliad、Shmaryahu Hoz

  DOI：10.1002/poc.482

  日期：2002.8

  The kinetics of chlorine transfer reactions between N-chlorosuccinimide (NCS) and four carbon nucleophiles (the conjugated bases of phenyldinitromethane, Meldrum's acid, phenylmalononitrile and phenylnitro-methane) in water were determined. A plot of log k for the SN2 reactions vs the pKa of the first three conjugated acids of the nucleophiles gave a straight line with a slope (βnuc) of 1.8. The data

  测定了N-氯琥珀酰亚胺（NCS）和四种碳亲核试剂（苯基二硝基甲烷，Meldrum的酸，苯基丙二腈和苯基硝基甲烷）的氯转移反应的动力学。S N 2反应的log k对亲核试剂的前三个共轭酸的p K a的曲线图给出了一条直线，斜率（βnuc）为1.8。单硝基衍生物苯基硝基甲烷的数据点与谱线的偏差为6.7 log个单位。该偏差是质子转移反应的典型现象，最近发现在S N中也发生对溴有2个反应。版权所有©2002 John Wiley＆Sons，Ltd.
• PHOTOSENSITIVE POLYSILAZANE COMPOSITION AND METHOD OF FORMING PATTERNED POLYSILAZANE FILM
  申请人：TonenGeneral Sekiyu K.K.

  公开号：EP1164435A1

  公开（公告）日：2001-12-19

  A photosensitive polysilazane which may be used as a positive-tone photoresist, and a method of forming a patterned polysilazane film by use of such a composition are provided. The photosensitive polysilazane composition of the invention is characterized by comprising a polysilazane, particularly polymethylsilazane or polyphenylsilazane, and an optically acid-generating agent. The patterned polysilazane film is obtained by exposing a coating of the photosensitive polysilazane composition of the invention to light in a pattern and dissolving off the exposed portion.

  本发明提供了一种可用作正色调光刻胶的光敏聚硅氮烷，以及使用这种组合物形成图案化聚硅氮烷薄膜的方法。本发明的光敏聚硅氮烷组合物的特点是由一种聚硅氮烷（特别是聚甲基硅氮烷或聚苯基硅氮烷）和一种光学酸生成剂组成。将本发明的光敏聚硅氮烷组合物涂层按一定图案对光照射，然后溶解掉照射部分，即可得到图案化的聚硅氮烷薄膜。
• PHOTOSENSITIVE POLYSILAZANE COMPOSITION, METHOD OF FORMING PATTERN THEREFROM, AND METHOD OF BURNING COATING FILM THEREOF
  申请人：CLARIANT INTERNATIONAL LTD.

  公开号：EP1239332A1

  公开（公告）日：2002-09-11

  A finely patterned silica type ceramic film suitable as an inter-layer dielectric is formed in a short time by applying, onto a substrate, a positive working radiation sensitive polysilazane composition comprising a modified poly(sil sesquiazane) having a number average molecular weight of 100 to 100,000 and containing a basic constituent unit represented by the general formula: -[SiR6(NR7)1.5]- and other constituent units represented by the general formula: -[SiR62NR7]- and/or -[SiR63(NR7)0.5]- (R6 and R7 independently represent a hydrogen atom, a C1-3 alkyl group or a substituted or unsubstituted phenyl group) in a ratio of 0.1 to 100 mol-% to said basic constituent unit, a photo acid generator and preferably a water-soluble compound as a shape stabilizer, then patternwise exposing the resultant coating film, subjecting the exposed part of the coating film to moistening treatment, developing it with an aqueous alkali solution, wholly exposing the coating film to light and moistening treatment again, followed by burning treatment.

  一种适用于层间电介质的精细图案化二氧化硅型陶瓷膜是通过在基底上涂敷一种正工作辐射敏感性聚硅氮烷组合物在短时间内形成的，该组合物包含一种改性聚硅氮烷，其平均分子量为 100 至 100000，并含有由通式表示的基本组成单元：-[SiR6(NR7)1.5]-和由通式代表的其他组成单元：-[SiR62NR7]-和/或-[SiR63(NR7)0.5]-(R6 和 R7 独立地代表氢原子、C1-3 烷基或取代或未取代的苯基)，与所述基本组成单元的比例为 0.然后，将所得涂膜进行图案化曝光，将涂膜的曝光部分进行湿润处理，用碱水溶液显影，将涂膜完全曝光于光并再次进行湿润处理，然后进行灼烧处理。
• PHOTOSENSITIVE COMPOSITION FOR INTERLAYER DIELECTRIC AND METHOD OF FORMING PATTERNED INTERLAYER DIELECTRIC
  申请人：AZ Electronic Materials (Japan) K.K.

  公开号：EP1548499A1

  公开（公告）日：2005-06-29

  There is provided a photosensitive composition which possesses excellent storage stability and can yield an interlayer insulation film with an improved film thickness limit. The photosensitive composition comprises a modified polysilsesquiazane having a weight average molecular weight of 500 to 200,000 comprising basic constitutional units represented by formula -[SiR1(NR2)1.5]- wherein R1's each independently represent an alkyl group having 1 to 3 carbon atoms or a substituted or unsubstituted phenyl group; R2's each independently represent hydrogen, an alkyl group having 1 to 3 carbon atoms, or a substituted or unsubstituted phenyl group, up to 50% by mole of the basic constitutional units having been replaced by a linking group other than the silazane bond; and a photoacid generating agent.

  本发明提供了一种光敏组合物，它具有优异的贮存稳定性，并能产生具有改进的膜厚度极限的层间绝缘膜。该光敏组合物包括一种改性聚硅烷基噻嗪，其重量平均分子量为 500 至 200,000，包含由式-[SiR1(NR2)1.5]-其中 R1 各自独立地代表具有 1 至 3 个碳原子的烷基或取代或未取代的苯基；R2 各自独立地代表氢、具有 1 至 3 个碳原子的烷基或取代或未取代的苯基，以摩尔计最多有 50%的基本构型单元被硅烷键以外的连接基团取代；以及一种光酸生成剂。
• Photosensitive ploysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof
  申请人：——

  公开号：US20030113657A1

  公开（公告）日：2003-06-19

  A finely patterned silica type ceramic film suitable as an inter-layer dielectric is formed in a short time by applying, onto a substrate, a positive working radiation sensitive polysilazane composition comprising a modified poly(sil sesquiazane) having a number average molecular weight of 100 to 100,000 and containing a basic constituent unit represented by the general formula: —[SiR 6 (NR 7 ) 1.5 ]— and other constituent units represented by the general formula: —[SiR 6 2 NR 7 ]— and/or —[SiR 6 3 (NR 7 ) 0.5 ]— (R 6 and R 7 independently represent a hydrogen atom, a C 1-3 alkyl group or a substituted or unsubstituted phenyl group) in a ratio of 0.1 to 100 mol-% to said basic constituent unit, a photo acid generator and preferably a water-soluble compound as a shape stabilizer, then patternwise exposing the resultant coating film, subjecting the exposed part of the coating film to moistening treatment, developing it with an aqueous alkali solution, wholly exposing the coating film to light and moistening treatment again, followed by burning treatment.

  通过在基底上涂敷一种正工作辐射敏感聚硅氮烷组合物，可在短时间内形成一种适于作为层间电介质的精细图案化二氧化硅型陶瓷膜，该组合物由改性聚（硅烷）组成，其平均分子量为 100 至 100000，并含有由通式表示的基本组成单元：-[SiR 6 (NR 7 ) 1.5 及其他由通式代表的组成单元：-[SiR 6 2 NR 7 ]-和/或-[SiR 6 3 （NR 7 ) 0.5 ]- (R 6 和 R 7 分别代表一个氢原子、一个 C 1-3 烷基或取代或未取代的苯基）的比例为 0.1 至 100 摩尔-%、光酸发生器和优选的水溶性化合物作为形状稳定剂，然后将得到的涂膜按图案进行曝光，将涂膜的曝光部分进行湿润处理，用碱水溶液显影，将涂膜完全暴露在光线下并再次进行湿润处理，然后进行灼烧处理。