申请人:Sumitomo Chemical Company, Limited
公开号:EP2311915A1
公开(公告)日:2011-04-20
An object of the present invention is to provide a composition for an insulating layer, which can form the insulating layer (for instance, a gate insulating film and a protective layer of a transistor) at a low temperature, and further can form the insulating layer having superior withstand voltage. The composition for an insulating layer according to the present invention includes a first compound formed of a polymer compound having two or more active hydrogen groups in the molecule, and a second compound formed of a low-molecular compound having, in the molecule, two or more groups that produce a functional group which reacts with an active hydrogen group by electromagnetic radiations or heat.
本发明的目的是提供一种用于绝缘层的组合物,它能在低温下形成绝缘层(例如,晶体管的栅极绝缘薄膜和保护层),并能进一步形成具有优异耐电压的绝缘层。根据本发明的绝缘层组合物包括第一种化合物和第二种化合物,第一种化合物由分子中含有两个或两个以上活性氢基的高分子化合物组成,第二种化合物由低分子化合物组成,分子中含有两个或两个以上产生官能团的基团,官能团在电磁辐射或热的作用下与活性氢基发生反应。