[EN] COMPOUNDS USEFUL IN HIV THERAPY<br/>[FR] COMPOSÉS UTILES DANS LA THÉRAPIE DU VIH
申请人:GLAXOSMITHKLINE IP DEV LTD
公开号:WO2020110056A1
公开(公告)日:2020-06-04
The invention relates to compounds of Formula (I), (Ia), (Ib), (II) or (III), salts thereof, pharmaceutical compositions thereof, as well as therapeutic methods of treatment and prevention.
and amines to form formamides is reported. The pure inorganic catalyst (NH4)3[FeMo6O18(OH)6] (1), which consists of a central FeIII single-atomic core supported within a cycle-shaped inorganic ligand consisting of six MoVIO6 octahedra, shows excellent activity and selectivity, and avoids the use of complicated/commercially unavailable organic ligands. Various primaryamines and secondaryamines have
报道了无机-配体负载的铁(III)催化的甲酸和胺偶联形成甲酰胺的第一个实例。纯无机催化剂(NH 4)3 [FeMo 6 O 18(OH)6 ](1),由负载在由六个Mo VI O 6组成的循环形无机配体中的中心Fe III单原子核组成八面体,具有出色的活性和选择性,并且避免使用复杂的/商业上不可用的有机配体。各种伯胺和仲胺已在温和条件下成功转化为相应的甲酰胺,而且伯二胺的甲酰化反应也首次实现。Fe催化剂1可以重复使用几次而没有明显的活性损失。
Chromium-catalysed efficient <i>N</i>-formylation of amines with a recyclable polyoxometalate-supported green catalyst
A green route to polyurethanes: oxidative carbonylation of industrially relevant aromatic diamines by CO<sub>2</sub>-based methyl formate
作者:Christine Hussong、Jens Langanke、Walter Leitner
DOI:10.1039/d0gc02412k
日期:——
The oxidative carbonylation of toluene-2,4-diamine (TDA) with methyl formate (MF), which can be produced from CO2, provides a possible route for the non-phosgene production of isocyanate precursors and enables a valuable utilization of the greenhouse gas. Extensive analysis of the product spectrum has provided detailed insight into the reaction network leading to the target product toluene-2,4-dicarbamate
METHOD OF FORMING PATTERN AND COMPOSITION FOR FORMING OF ORGANIC THIN-FILM FOR USE THEREIN
申请人:Shimizu Daisuke
公开号:US20100233635A1
公开(公告)日:2010-09-16
A method for forming a pattern contains (1) a step of forming an underlayer film containing (A) a radiation-sensitive acid generator capable of generating an acid upon exposure to radiation rays or (B) a radiation-sensitive base generator capable of generating a base upon exposure to radiation rays on a substrate; (2) a step of irradiating the underlayer film with radiation rays through a mask with a predetermined pattern to obtain an exposed underlayer film portion having been selectively exposed through the predetermined pattern; (3) a step of forming (C) an organic thin film on the underlayer film so as to attain chemical bonding of the exposed underlayer film portion with the organic thin-film formed on the exposed underlayer film portion; and (4) a step of removing the organic thin film formed on areas of the underlayer film other than the exposed underlayer film portion.