We had found the novel N-alkylation method, which utilizes carboxylicacids as alkyl sources with sodium triacetoxyborohydride [NaBH(OAc)3]. Our methodology had been revealed to have some advantages over the reported similar procedures. Through the further investigation about our method, it was disclosed that acetonitrile was the suitable solvent and N-alkylation for aliphatic amines were also smoothly
A positive photoresist composition comprising:
(A) an oxime sulfonate compound represented by the specific formula,
(B) a resin comprising repeating units including a group represented by the specific formula and which increases the solubility in an alkaline developing solution by the action of an acid, and
(C) a fluoroaliphatic-group-containing polymeric compound containing repeating units derived from a monomer represented by the specific formula.
A resin composition comprising a specified ethylenic copolymer, a polyhydric alcohol and a reaction promoter, and a thermally reversibly cross-linking molding produced therefrom. Because both the composition and the molding have a high cross-linkage dissociating velocity when heated and a high cross-linkage forming velocity when cooled, they can be utilized in various applications including melt molding as substantially practicable, thermally reversibly cross-linking composition and molding.
Polymer and thermosetting composition containing same
申请人:Fujifilm Electronic Materials U.S.A., Inc.
公开号:US10604628B2
公开(公告)日:2020-03-31
This disclosure relates to a polymer that includes a first repeat unit and at least one end-cap group at one end of the polymer. The first repeat unit includes at least one imide moiety and at least one indane-containing moiety. The end-cap group is capable of undergoing a cycloreversion reaction. This disclosure also relates to a thermosetting composition containing the above polymer.