A radiation-sensitive resin composition comprising a quinonediazide-type radiation-sensitive resin and a compound generating an acid upon irradiation. Said radiation-sensitive resin composition can be used as a resist suitable for dry development by plasma etching and enables one to obtain an etching image having high precision with high reproducibility at a high degree of resolution and selectivity.
MODIFIED NITRILASES AND THEIR USE IN METHODS FOR THE PRODUCTION OF CARBOXYLIC ACIDS
申请人:BASF SE
公开号:EP1599584B1
公开(公告)日:2009-07-01
Modified nitrilases and their use in methods for the production of carboxylic acids
申请人:Zelinski Thomas
公开号:US20060259999A1
公开(公告)日:2006-11-16
The present Invention relates to new nitrilases with modified Substrate acceptance, the method to obtain them and the use of the aforesaid nitrilases. Said nitrilases are encoded by a polypeptide sequence, which at a Position corresponding to Position 296 in wild-type
Alcaligenes faecalis
comprises an amino acid which is not tyrosine. The Invention further relates to nucleic acid sequences and amino acid sequences encoding Said nitrilases, expression constructs comprising Said nucleic acid sequences, vectors comprising the nucleic acid sequences or the exPression constructs, to organisms, preferably microorganisms, comprising the nucleic acid sequences, expression constructs or vectors. The Invention additionally relates to a method for preparing carboxylic acids, preferably substituted chiral carboxylic acids from racemic nitriles.