申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:US20160291467A1
公开(公告)日:2016-10-06
A resist composition contains: a resin having an acid-labile group, a resin having a structural unit represented by formula (I), an acid generator, and a solvent;
wherein R
i41
represents a hydrogen atom or a methyl group, R
i42
represents a C
1
to C
10
hydrocarbon group that may be substituted with a hydroxy group, a C
2
to C
7
acyl group or a hydrogen atom, R
i43
in each occurrence independently represents a C
1
to C
6
alkyl group or a C
1
to C
6
alkoxy group, “p” represents an integer of 0 to 4, Z represents a divalent C
3
to C
20
hydrocarbon group having a group represented by formula (Ia), and a methylene group contained in the hydrocarbon group may be replaced by an oxygen atom, a sulfur atom or a carbonyl group, *—[(CH
2
)
w
—O]
r
— (Ia): wherein “w” and “r” each independently represents an integer of 1 to 10, and * represent a bonding position.