2-(2-Hydroxyethoxy)ethanol;2-(oxolan-2-ylmethoxymethyl)oxolane

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 氧唑烯
• 英文名称: 2-(2-Hydroxyethoxy)ethanol;2-(oxolan-2-ylmethoxymethyl)oxolane
• 英文别名: 2-(2-hydroxyethoxy)ethanol;2-(oxolan-2-ylmethoxymethyl)oxolane
• 化学式: C14H28O6
• 分子量: 292.37
• InChiKey: VZFRSHKDULBPMK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.35
• 重原子数：
  20
• 可旋转键数：
  8
• 环数：
  2.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  77.4
• 氢给体数：
  2
• 氢受体数：
  6

文献信息

• Photoresist remover compositions
  申请人：Merck Patent GmbH

  公开号：US11365379B2

  公开（公告）日：2022-06-21

  The present invention relates to a composition consisting essentially of a sulfonic acid component selected from the group consisting of camphor sulfonic acid, and a benzene sulfonic acid of structure (I), wherein R is H or a C-1 to C-18 n-alkyl, oxalic acid, a solvent component which consists essentially of an organic solvent component, or a mixture of an organic solvent components and water, wherein the organic solvent component consist of about 100 wt % to about 85 wt % of said solvent component, and further wherein said organic solvent component is either selected from solvent (III), (IV), (V), (VI) (wherein R is selected from the group consisting of —(-0-CH2—CH2—)n, —OH, —OH, and -0-C(═O)—CH3, wherein n′ is equal to 1, 2, 3, or 4), (VII) (wherein Ra is H or a C-1 to C-4 alkyl moiety), (VIII), (IX) (wherein Rb is a C-1 to C-18 alkyl moiety), (X), and (XI) or is a mixture, of at least two organic solvents selected from this group. The invention also relates to such compositions also containing a surfactant component, and also pertains to the process of using either of these compositions as a resist remover. Dipropylene glycol monomethyl ether (III),

  本发明涉及一种组合物，该组合物主要由选自樟脑磺酸、结构(I)的苯磺酸（其中R为H或C-1至C-18正烷基）、草酸组成的组的磺酸组分、主要由有机溶剂组分组成的溶剂组分或有机溶剂组分与水的混合物组成，其中有机溶剂组分占所述溶剂组分的约100重量％至约85重量％、其中 R 选自-(-0-CH2- -)n、-OH、-OH 和-0-C(═O)-CH3 组成的组、其中 n′等于 1、2、3 或 4）、(VII)（其中 Ra 是 H 或 C-1 至 C-4 烷基）、(VIII)、(IX)（其中 Rb 是 C-1 至 C-18 烷基）、(X)和(XI)或至少两种选自这一组的有机溶剂的混合物。本发明还涉及同样含有表面活性剂成分的此类组合物，并涉及使用其中任一组合物作为抗蚀剂去除剂的工艺。 二丙二醇单甲醚 (III)、
• PHOTORESIST REMOVER COMPOSITIONS
  申请人：Merck Patent GmbH

  公开号：EP3743773A1

  公开（公告）日：2020-12-02
• SELF-EMULSIFYING DOSAGE FORMS OF ALLERGEN AND THEIR PREPARATION THEREOF
  申请人：Jubilant Pharma Holdings Inc.

  公开号：US20210236629A1

  公开（公告）日：2021-08-05

  The present invention relates to self-emulsifying pharmaceutical compositions in the field of allergen(s) and/or allergenic extract(s). Further within the scope of the invention is self-emulsifying oral pharmaceutical compositions and kits for compounding pharmaceuticals compositions that include at least one allergen as an active agent and one or more pharmaceutically acceptable excipients. The present invention also relates to processes for preparing such compositions. These pharmaceutical compositions are useful in the treatment of various types of allergies such as drug allergy, food allergy, insect allergy, latex allergy, mold allergy, pet allergy, and pollen allergy.
• SELF-EMULSIFYING SOLID ORAL DOSAGE FORMS OF ALLERGEN AND THEIR PREPARATION THEREOF
  申请人：Jubilant Generics Limited

  公开号：US20210236628A1

  公开（公告）日：2021-08-05

  The present invention relates to self-emulsifying pharmaceutical compositions in the field of allergen(s) and/or allergenic extract(s). Further within the scope of the invention is self-emulsifying solid oral pharmaceutical compositions comprising at least one allergen as an active agent and one or more pharmaceutically acceptable excipients. The present invention also relates to processes for preparing such compositions. These pharmaceutical compositions are useful in the treatment of various types of allergies such as drug allergy, food allergy, insect allergy, latex allergy, mold allergy, pet allergy, and pollen allergy.
• US8835509B2
  申请人：——

  公开号：US8835509B2

  公开（公告）日：2014-09-16