2,3,4,2'-tetrahydroxy-4'-methyl-benzophenone | 109067-41-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 2,3,4,2'-tetrahydroxy-4'-methyl-benzophenone
• 英文别名: 2,3,4,2'-Tetrahydroxy-4'-methyl-benzophenon；(2-Hydroxy-4-methylphenyl)-(2,3,4-trihydroxyphenyl)methanone
• CAS: 109067-41-6
• 化学式: C₁₄H₁₂O₅
• 分子量: 260.246
• InChiKey: DIBYQTLCOMYUAP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.8
• 重原子数：
  19
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.07
• 拓扑面积：
  98
• 氢给体数：
  4
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  2,3,4,2'-tetrahydroxy-4'-methyl-benzophenone 在 水 、 potassium carbonate 、 丙酮 作用下， 生成 5,6-Dimethoxy-3-methyl-xanthon
  参考文献：
  名称：

  Kane et al., Journal Of Scientific and Industrial Research, 1959, vol. 18 B, p. 28,30

  摘要：

  DOI：

文献信息

• Photosensitive resin composition for photoresist
  申请人：——

  公开号：US20040248030A1

  公开（公告）日：2004-12-09

  The present invention relates to a photosensitive resin composition for use as a photoresist, and more particularly, to a photosensitive resin composition for a photoresist comprising an acrylate copolymer obtained by selectively using specific compounds or controlling the ratio of unreacted monomers, and a 1,2-quinonediazide compound, which is excellent in several performance factors such as dielectric characteristics, flatness, transparency, developing performance, residual film rate, chemical resistance, and heat resistance, as well as sensitivity and resolution, and in particular it facilitates easy pattern formation into interlayer dielectrics, and it can be used as a photoresist in an LCD manufacturing process due to its excellent transmissivity even when prepared as a thick film.

  本发明涉及一种用作光刻胶的感光树脂组合物，更具体地说，涉及一种用于光刻胶的感光树脂组合物，该组合物包含一种通过选择性使用特定化合物或控制未反应单体的比例而获得的丙烯酸酯共聚物，以及一种 1,2-醌噻嗪化合物、该化合物在介电特性、平整度、透明度、显影性能、残膜率、耐化学性、耐热性、灵敏度和分辨率等多个性能因素方面都非常出色，尤其是它易于在层间电介质中形成图案，即使制备成厚膜，也具有出色的透射率，因此可用作液晶制造工艺中的光刻胶。
• Norbornene polymer for photoresist and photoresist composition comprising the same
  申请人：Lee Jun Jae

  公开号：US20060188806A1

  公开（公告）日：2006-08-24

  Disclosed herein is a photoresist composition which includes a norbomene copolymer having an epoxy group, an acid generator, and an organic solvent. The norbomene polymer shows superior mechanical and thermal properties, high transparency, excellent insulating properties, and particularly, improved mechanical properties due to the presence of an epoxy group. The photosensitive resin composition shows superior performance, e.g., transparence, developing properties, residual film characteristics, chemical resistance, heat resistance, and flatness. Particularly, since the photosensitive resin composition enables easy formation of a pattern as an interlayer insulating film and shows a high light transmittance even when being formed into a thin film with a relatively large thickness, it is suitable for the production of an interlayer insulating film used in the fabrication processes of LCDs.

  本文公开了一种光致抗蚀剂组合物，它包括一种具有环氧基团的诺布孟尼共聚物、一种酸生成物和一种有机溶剂。这种诺波明聚合物具有优异的机械和热性能、高透明度和出色的绝缘性能，特别是由于环氧基团的存在，其机械性能得到了改善。感光树脂组合物具有优异的性能，如透明度、显影性能、残膜特性、耐化学性、耐热性和平整度。特别是，由于该感光树脂组合物易于形成作为层间绝缘膜的图案，即使形成厚度相对较大的薄膜，也能显示出较高的透光率，因此适用于生产用于液晶显示器制造工艺的层间绝缘膜。
• METHOD OF FABRICATING A THIN FILM TRANSISTOR SUBSTRATE AND A PHOTOSENSITIVE COMPOSITION USED IN THE THIN FILM TRANSISTOR SUBSTRATE
  申请人：KANG Hoon

  公开号：US20090030103A1

  公开（公告）日：2009-01-29

  Disclosed is a method of producing a thin film transistor substrate having high light sensitivity, heat-resistance, impact resistance, and a photosensitive composition used by the same, the method including forming data wires on an insulating substrate, forming an organic insulating film on the data wires by applying a photosensitive composition comprising a terpolymer, where the terpolymer is derived from monomers of an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture thereof, an unsaturated epoxy group-containing compound, and an olefinic compound.
• NORBORNENE POLYMER FOR PHOTORESIST AND PHOTORESIST COMPOSITION COMPRISING THE SAME
  申请人：LEE Jae Jun

  公开号：US20090075207A1

  公开（公告）日：2009-03-19

  Disclosed herein is a photoresist composition which includes a norbornene copolymer having an epoxy group, an acid generator, and an organic solvent. The norbornene polymer shows superior mechanical and thermal properties, high transparency, excellent insulating properties, and particularly, improved mechanical properties due to the presence of an epoxy group. The photosensitive resin composition shows superior performance, e.g., transparence, developing properties, residual film characteristics, chemical resistance, heat resistance, and flatness. Particularly, since the photosensitive resin composition enables easy formation of a pattern as an interlayer insulating film and shows a high light transmittance even when being formed into a thin film with a relatively large thickness, it is suitable for the production of an interlayer insulating film used in the fabrication processes of LCDs.
• LIQUID CRYSTAL DISPLAY ELEMENT, POSITIVE TYPE RADIATION SENSITIVE COMPOSITION, INTERLAYER INSULATING FILM FOR LIQUID CRYSTAL DISPLAY ELEMENT, AND FORMATION METHOD THEREOF
  申请人：ICHINOHE Daigo

  公开号：US20110281040A1

  公开（公告）日：2011-11-17

  Provided by the present invention is a liquid crystal display element including: two substrates disposed oppositely, an interlayer insulating film laminated on the inner face side of at least one of the substrates, and a liquid crystal layer being provided between the substrates, and being formed from a polymerizable liquid crystal composition, in which a resin constituting the interlayer insulating film has a crosslinking moiety of a polymer represented by the following formula (1):