Photopatternable compositions and methods of fabricating transistor devices using same
申请人:Flexterra, Inc.
公开号:US10551745B2
公开(公告)日:2020-02-04
The present teachings relate to compositions for forming a negative-tone photopatternable dielectric material, where the compositions include, among other components, an organic filler and one or more photoactive compounds, and where the presence of the organic filler enables the effective removal of such photoactive compounds (after curing, and during or after the development step) which, if allowed to remain in the photopatterned dielectric material, would lead to deleterious effects on its dielectric properties.
本发明涉及用于形成负色调可光绘介电材料的组合物,其中组合物除其他成分外,还包括有机填料和一种或多种光活性化合物,并且有机填料的存在能够有效去除这些光活性化合物(在固化后、显影步骤期间或之后),如果允许这些光活性化合物残留在光绘介电材料中,会对其介电特性产生有害影响。