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[4-(2,2,5,5-Tetramethylhexan-3-yl)phenyl] 2-(3-cyano-2-oxochromen-6-yl)oxyacetate

中文名称
——
中文别名
——
英文名称
[4-(2,2,5,5-Tetramethylhexan-3-yl)phenyl] 2-(3-cyano-2-oxochromen-6-yl)oxyacetate
英文别名
[4-(2,2,5,5-tetramethylhexan-3-yl)phenyl] 2-(3-cyano-2-oxochromen-6-yl)oxyacetate
[4-(2,2,5,5-Tetramethylhexan-3-yl)phenyl] 2-(3-cyano-2-oxochromen-6-yl)oxyacetate化学式
CAS
——
化学式
C28H31NO5
mdl
——
分子量
461.5
InChiKey
IDGOFJYECBKLQC-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    7.3
  • 重原子数:
    34
  • 可旋转键数:
    9
  • 环数:
    3.0
  • sp3杂化的碳原子比例:
    0.39
  • 拓扑面积:
    85.6
  • 氢给体数:
    0
  • 氢受体数:
    6

文献信息

  • Photopatternable compositions and methods of fabricating transistor devices using same
    申请人:Flexterra, Inc.
    公开号:US10551745B2
    公开(公告)日:2020-02-04
    The present teachings relate to compositions for forming a negative-tone photopatternable dielectric material, where the compositions include, among other components, an organic filler and one or more photoactive compounds, and where the presence of the organic filler enables the effective removal of such photoactive compounds (after curing, and during or after the development step) which, if allowed to remain in the photopatterned dielectric material, would lead to deleterious effects on its dielectric properties.
    本发明涉及用于形成负色调可光绘介电材料的组合物,其中组合物除其他成分外,还包括有机填料和一种或多种光活性化合物,并且有机填料的存在能够有效去除这些光活性化合物(在固化后、显影步骤期间或之后),如果允许这些光活性化合物残留在光绘介电材料中,会对其介电特性产生有害影响。
  • Photopatternable Compositions and Methods of Fabricating Transistor Devices Using Same
    申请人:Flexterra, Inc.
    公开号:US20170227846A1
    公开(公告)日:2017-08-10
    The present teachings relate to compositions for forming a negative-tone photopatternable dielectric material, where the compositions include, among other components, an organic filler and one or more photoactive compounds, and where the presence of the organic filler enables the effective removal of such photoactive compounds (after curing, and during or after the development step) which, if allowed to remain in the photopatterned dielectric material, would lead to deleterious effects on its dielectric properties.
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