CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:US20210263416A1
公开(公告)日:2021-08-26
Disclosed are a carboxylate represented by formula (I), and a carboxylic acid generator and a resist composition, including the same:
wherein R
1
represents a fluorine atom or a fluorinated alkyl group having 1 to 4 carbon atoms; R
2
, R
3
and R
4
each independently represent a halogen atom, a fluorinated alkyl group having 1 to 4 carbon atoms or a hydrocarbon group having 1 to 12 carbon atoms, and —CH
2
— included in the hydrocarbon group may be replaced by —O— or —CO—; m2 and m3 represent an integer of 0 to 4, and m4 represents an integer of 0 to 5; and X
0
represents a hydrocarbon group having 1 to 72 carbon atoms which may have a substituent, and —CH
2
— included in the hydrocarbon group may be replaced by —O—, —S—, —CO— or —SO
2
—.
本发明涉及一种由式(I)表示的羧酸盐、羧酸发生剂和抗蚀组合物,其中:其中,R1表示氟原子或具有1至4个碳原子的氟化烷基;R2、R3和R4各自独立地表示卤素原子、具有1至4个碳原子的氟化烷基或具有1至12个碳原子的碳氢基团,且所述碳氢基团中包含的—CH2—可以被—O—或—CO—所替代;m2和m3表示0至4的整数,m4表示0至5的整数;X0表示具有1至72个碳原子的碳氢基团,该碳氢基团可能具有取代基,且所述碳氢基团中包含的—CH2—可以被—O—、—S—、—CO—或—SO2—所替代。