Radiation-sensitive composition and pattern-formation method using the same
申请人:Hitachi, Ltd.
公开号:EP0070198A1
公开(公告)日:1983-01-19
A radiation-sensitive composition comprising (i) an iodine-containing azide compound at least a part of which can be fixed substantially in a polymer by exposure to radiation and a polymer, or (ii) an azide compound, and an iodine compound at least a part of which can be fixed substantially in a polymer by exposure to a radiation and a polymer; and a said polymer substantially having compatibility with the azide compound in case (i) or the azide compound and the iodine compound in case (ii). This composition can be subjected to dry development with oxygen plasma after the exposure followed by heating, or it can be developed with an aqueous alkaline solution if the polymer is soluble therein.
一种对辐射敏感的组合物,包括:(i) 含碘叠氮化合物,其中至少有一部分可通过辐射和聚合物的照射而基本固定在聚合物中,或 (ii) 叠氮化合物和碘化合物,其中至少有一部分可通过辐射和聚合物的照射而基本固定在聚合物中;以及所述聚合物与(i)情况下的叠氮化合物或(ii)情况下的叠氮化合物和碘化合物基本相容。这种组合物可以在曝光后用氧等离子体进行干显影,然后加热;如果聚合物可溶于碱性水溶液,也可以用碱性水溶液显影。
US4465768A
申请人:——
公开号:US4465768A
公开(公告)日:1984-08-14
Pattern-formation method with iodine containing azide and oxygen plasma
申请人:Hitachi, Ltd.
公开号:US04465768A1
公开(公告)日:1984-08-14
A radiation-sensitive composition comprising an iodine-containing azide compound at least a part of which can be fixed substantially in a polymer by exposure to a radiation and a polymer, or a radiation-sensitive composition comprising an azide compound, an iodine compound at least a part of which can be fixed substantially in a polymer by exposure to a radiation and a polymer. This composition can be subjected to the dry development with oxygen plasma after the exposure followed by heating.