(4-Hydroxy-3-methoxyphenyl)-(2,3,4-trihydroxyphenyl)methanone | 125527-44-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: (4-Hydroxy-3-methoxyphenyl)-(2,3,4-trihydroxyphenyl)methanone
• CAS: 125527-44-8
• 化学式: C₁₄H₁₂O₆
• 分子量: 276.246
• InChiKey: FVHMFMMVURPZFE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.4
• 重原子数：
  20
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.07
• 拓扑面积：
  107
• 氢给体数：
  4
• 氢受体数：
  6

反应信息

• 作为产物：
  描述：

  2,3,4-三羟基苯甲酸 、 木榴油 在 zinc(II) chloride 、 三氯氧磷 作用下， 反应 2.5h， 生成 (4-Hydroxy-3-methoxyphenyl)-(2,3,4-trihydroxyphenyl)methanone
  参考文献：
  名称：

  聚羟基二苯甲酮作为 α-葡萄糖苷酶抑制剂的评价

  摘要：

  本实验旨在利用Friedel-Crafts反应合成18种多羟基二苯甲酮，以对硝基苯基-β-D-吡喃半乳糖苷（PNPG）为底物，测定对α-葡萄糖苷酶的抑制活性。在这里，阿卡波糖 (IC50 = 1674.75 µmol L - 1) 用作参考抑制剂。结果表明，大多数目标化合物对α-葡萄糖苷酶具有显着的抑制活性。在所有这些化合物中，2,4,4', 6-butahydroxydiphenylketone (11) 被发现是最有效的 α-葡萄糖苷酶抑制剂，IC50 值为 10.62 µmol L - 1。此外，我们通过动力学分析发现这些化合物是竞争性抑制剂。结果表明，此类化合物可用于开发新的糖尿病治疗候选药物。

  DOI：

  10.1002/ardp.201000147

文献信息

• Methanofullerenes
  申请人：Robinson Alex Philip Graham

  公开号：US20140134843A1

  公开（公告）日：2014-05-15

  The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

  本公开涉及新型甲烷富勒烯衍生物，由此制备的负型光刻胶组合物以及使用它们的方法。这些衍生物、它们的光刻胶组合物和方法非常适合使用紫外线辐射、超极紫外线辐射、极紫外线辐射、X射线和带电粒子束进行精细图案加工。
• [EN] METHANOFULLERENES<br/>[FR] MÉTHANOFULLERRÈNES
  申请人：ROBINSON ALEX PHILIP GRAHAM

  公开号：WO2014078097A1

  公开（公告）日：2014-05-22

  The present disclosure relates to novel methanofullerene derivatives, negative- type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

  本公开涉及新型甲烷富勒烯衍生物，由此制备的负型光刻胶组合物以及使用它们的方法。这些衍生物，它们的光刻胶组合物和方法非常适合使用紫外线辐射、超过极紫外线辐射、极紫外线辐射、X射线和带电粒子射线等技术进行精细图案处理。
• [EN] METHANOFULLERENES<br/>[FR] MÉTHANOFULLERÈNES
  申请人：ROBINSON ALEX PHILIP GRAHAM

  公开号：WO2014137663A1

  公开（公告）日：2014-09-12

  The present disclosure relates to novel methanofullerene derivatives, negative- type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.

  本公开涉及新型甲烷富勒烯衍生物，制备其负型光阻组合物和使用它们的方法。这些衍生物、它们的光阻组合物和方法非常适合使用紫外线辐射、超过极紫外线辐射、极紫外线辐射、X射线和带电粒子射线进行精细图案处理。还公开了负光敏组合物。
• COMPOSITE PARTICLE FOR DIELECTRICS, ULTRAMICROPARTICULATE COMPOSITE RESIN PARTICLE, COMPOSITION FOR FORMING DIELECTRICS AND USE THEREOF
  申请人：JSR Corporation

  公开号：EP1387367A1

  公开（公告）日：2004-02-04

  The dielectric-forming composition according to the invention is characterized by consisting of: composite particles for dielectrics in which part or all of the surfaces of inorganic particles with permittivity of 30 or greater are coated with a conductive metal or a compound thereof, or a conductive organic compound or a conductive inorganic material; and (B) a resin component constituted of at least one of a polymerizable compound and a polymer. In addition, another dielectric-forming composition according to the invention is characterized by containing: ultrafine particle-resin composite particles composed of (J) inorganic ultrafine particles with the average particle size of 0.1 µm or smaller, and (B) a resin component constituted of at least one of a polymerizable compound and a polymer, wherein part or all of the surfaces of the inorganic ultrafine particles (J) are coated with the resin component (B), and the ultrafine particle-resin composite particles contain 20% by weight or more of the inorganic ultrafine particles (J); and inorganic particles with the average particle size of 0.1 to 2 µm and permittivity of 30 or greater, or inorganic composite particles in which a conductive metal or a compound thereof, or a conductive organic compound or a conductive inorganic material is deposited on the part or all of the surfaces of the inorganic particles.

  根据本发明，电介质形成组合物的特征在于： (A) 电介质复合颗粒，其中介电常数大于等于 30 的无机颗粒的部分或全部表 面涂覆导电金属或其化合物，或导电有机化合物或导电无机材料； 以及 (B) 由可聚合化合物和聚合物中至少一种构成的树脂成分。 此外，根据本发明的另一种电介质形成组合物，其特征在于含有 超细粒子-树脂复合粒子，由 (J) 平均粒径为 0.1 微米或更小的无机超细粒子和 (B) 由可聚合化合物和聚合物中的至少一种构成的树脂组分组成，其中无机超细粒子 (J) 的部分或全部表面涂有树脂组分 (B)，且超细粒子-树脂复合粒子含有 20% （重量百分比）或更多的无机超细粒子 (J)；以及 平均粒径为 0.1 至 2 微米、介电常数为 30 或更大的无机颗粒，或在无机颗粒的部分或全部表面沉积了导电金属或其化合物、导电有机化合物或导电无机材料的无机复合颗粒。
• Multiple trigger photoresist compositions and methods
  申请人：Robinson Alex Phillip Graham

  公开号：US10095112B2

  公开（公告）日：2018-10-09

  The present disclosure relates to novel multiple trigger negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

  本公开涉及新型多触发阴性工作光刻胶组合物和工艺。这些工艺包括在第一步中去除交联官能团上的酸标签保护基团，在第二步中用酸敏感交联剂交联交联官能团。在光刻胶催化链中加入多重触发途径可增加接受低剂量辐照区域的化学梯度，有效地起到内置剂量依赖性淬火器-模拟器的作用，从而提高化学梯度，进而提高分辨率、分辨率模糊度和曝光宽容度。光刻胶组合物和方法非常适合使用紫外线辐射、超强紫外线辐射、极紫外线辐射、X 射线和带电粒子射线等进行精细图案处理。