5-Hydroxy-1,3-bis(methoxymethyl)tetrahydropyrimidin-2(1H)-one | 13747-14-3

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 二嗪类
• 英文名称: 5-Hydroxy-1,3-bis(methoxymethyl)tetrahydropyrimidin-2(1H)-one
• 英文别名: 5-hydroxy-1,3-bis(methoxymethyl)-1,3-diazinan-2-one
• CAS: 13747-14-3
• 化学式: C₈H₁₆N₂O₄
• 分子量: 204.22
• InChiKey: ZFELQUOLGPARBA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -1.2
• 重原子数：
  14
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.88
• 拓扑面积：
  62.2
• 氢给体数：
  1
• 氢受体数：
  4

文献信息

• Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, electronic device and novel compound
  申请人：FUJIFILM Corporation

  公开号：US10324374B2

  公开（公告）日：2019-06-18

  There is provided an active light sensitive or radiation sensitive resin composition which contains (A) an alkali soluble resin and (C) a cross-linking agent represented by the following General Formula (1-0).

  本发明提供了一种活性光敏或辐射敏感树脂组合物，它含有 (A) 碱溶性树脂和 (C) 由下式（1-0）表示的交联剂。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANKS INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD AND PHOTOMASK
  申请人：FUJIFILM Corporation

  公开号：US20150086911A1

  公开（公告）日：2015-03-26

  An actinic ray-sensitive or radiation-sensitive resin composition includes; a compound (A) which generates an acid by irradiation with actinic rays or radiation, wherein the acid is linked with a group represented by the following general formula (M) through covalent bonding. In the formula, Y 1 and Y 2 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an alkenyl group, an alkynyl group, an aryl group, or an acyl group. Z represents a hydrogen atom or a substituent. * represents a linking site with a residue of the compound (A)
• ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE AND NOVEL COMPOUND
  申请人：FUJIFILM Corporation

  公开号：US20160209746A1

  公开（公告）日：2016-07-21

  There is provided an active light sensitive or radiation sensitive resin composition which contains (A) an alkali soluble resin and (C) a cross-linking agent represented by the following General Formula (1-0).