COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION
申请人:MITSUBISHI GAS CHEMICAL COMPANY, INC.
公开号:EP1666970A1
公开(公告)日:2006-06-07
The compound of the present invention is represented by the following formula 1:
wherein R1, R2, R4, R5, m0 to m2, and n0 to n2 are as defined in the description. Radiation sensitive compositions containing the compound of the formula 1 as a main component of the solid component are excellent in sensitivity, resolution, heat resistance, etching resistance, and solubility in solvent.
ANTI-REFLECTION FILM LAMINATE, ANTI-REFLECTION FILM, AND METHOD FOR MANUFACTURING ANTI-REFLECTION FILM LAMINATE
申请人:MITSUBISHI GAS CHEMICAL COMPANY, INC.
公开号:EP3943987A1
公开(公告)日:2022-01-26
An objective of the present invention is to provide an anti-reflection film laminate which is for manufacturing an anti-reflection film having low surface reflectance and good anti-reflection properties, as well as excellent thermoformability and scratch resistance. The aforementioned problem is resolved by the following anti-reflection film laminate. This anti-reflection film laminate comprises: a first laminate having a base film that has a release surface, and an optical interference layer laminated on the release surface; and a second laminate having a substrate layer that contains a thermoplastic resin, and an uncured hardcoat layer that is laminated on one surface of the substrate layer and comprises a curable hardcoat composition. The first and second laminate bodies are pressure bonded such that the optical interference layer of the first laminate and the uncured hardcoat layer of the second laminate are in contact with each other.