6-cyclohexyl-4-{[3-cyclohexyl-4-hydroxy-5-(hydroxymethyl)phenyl]cyclohexyl}-2-(hydroxymethyl)phenol | 253167-67-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 6-cyclohexyl-4-{[3-cyclohexyl-4-hydroxy-5-(hydroxymethyl)phenyl]cyclohexyl}-2-(hydroxymethyl)phenol
• 英文别名: 1,1-bis(3-cyclohexyl-4-hydroxy-5-hydroxymethylphenyl)cyclohexane；2-Cyclohexyl-4-[1-[3-cyclohexyl-4-hydroxy-5-(hydroxymethyl)phenyl]cyclohexyl]-6-(hydroxymethyl)phenol
• CAS: 253167-67-8
• 化学式: C₃₂H₄₄O₄
• 分子量: 492.699
• InChiKey: LQMGZWYJGXUYGP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  9.8
• 重原子数：
  36
• 可旋转键数：
  6
• 环数：
  5.0
• sp3杂化的碳原子比例：
  0.62
• 拓扑面积：
  80.9
• 氢给体数：
  4
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  6-cyclohexyl-4-{[3-cyclohexyl-4-hydroxy-5-(hydroxymethyl)phenyl]cyclohexyl}-2-(hydroxymethyl)phenol 、 水杨醛 在 三氟乙酸 作用下， 反应 24.5h， 以77.8%的产率得到(5-{[5-({3-[(3-carbonyl-4-hydroxyphenyl)methyl]-5-cyclohexyl-4-hydroxyphenyl}cyclohexyl)-3-cyclohexyl-2-hydroxyphenyl]methyl}-2-hydroxyphenyl)formaldehyde
  参考文献：
  名称：

  WO2006/90757

  摘要：

  公开号：

文献信息

• WO2006/90757
  申请人：——

  公开号：——

  公开（公告）日：——
• JP2000001448A
  申请人：——

  公开号：JP2000001448A

  公开（公告）日：2000-01-07
• POSITIVE RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND COMPOUND
  申请人：Shiono Daiju

  公开号：US20090035691A1

  公开（公告）日：2009-02-05

  A positive resist composition that includes a base material component (A) that contains an acid-dissociable, dissolution-inhibiting group and exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the base material component (A) contains a compound (A 1 ), in which either a portion of, or all of, the hydrogen atoms of phenolic hydroxyl groups within a polyhydric phenol compound with a molecular weight of 300 to 2,500 represented by a general formula (I) shown below have been substituted with at least one group selected from the group consisting of acid-dissociable, dissolution-inhibiting groups represented by a general formula (II) shown below and acid-dissociable, dissolution-inhibiting groups represented by a general formula (III) shown below.
• NOVEL BIS-(HYDROXYBENZALDEHYDE) COMPOUND AND NOVEL POLYNUCLEAR POLYPHENOL COMPOUND DERIVED THEREFROM AND METHOD FOR PRODUCTION THEREOF
  申请人：Yoshitomo Akira

  公开号：US20090076310A1

  公开（公告）日：2009-03-19

  Provide a new bis-(hydroxybenzaldehyde) compound, as well as a new polynuclear polyphenol compound derived therefrom, suitable for use as component materials for photosensitive resist compositions, component materials and hardeners for epoxy resins, developers and anti-fading agents used in thermosensitive recording materials, bactericides, fungicides, antioxidants and other functional chemical products or component materials thereof, wherein such bis-(hydroxybenzaldehyde) compound is produced by reacting in the presence of trihalogenated acetic acid catalyst or phosphoric acid catalyst a 2,6-di(hydroxymethyl)-4-alkylphenol with a hydroxybenzaldehyde expressed by general formula (14).
• US7586009B2
  申请人：——

  公开号：US7586009B2

  公开（公告）日：2009-09-08