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2,3-Dihydroxypropyl 2-methylbutanoate | 823192-47-8

中文名称
——
中文别名
——
英文名称
2,3-Dihydroxypropyl 2-methylbutanoate
英文别名
——
2,3-Dihydroxypropyl 2-methylbutanoate化学式
CAS
823192-47-8
化学式
C8H16O4
mdl
——
分子量
176.21
InChiKey
SSSZNDQONFCIQA-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    0.2
  • 重原子数:
    12
  • 可旋转键数:
    6
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.88
  • 拓扑面积:
    66.8
  • 氢给体数:
    2
  • 氢受体数:
    4

文献信息

  • NUCLEIC ACID PURIFICATION METHOD
    申请人:Erbacher Christoph
    公开号:US20110319506A1
    公开(公告)日:2011-12-29
    The present invention relates to a method for purifying nucleic acids using a nucleic acid-binding phase which is furnished with a deficit of nucleic acid-binding groups A having a pK of 8 to 13, or which has groups A and binding-inhibiting groups N which are neutrally charged during the binding, and preferably during the elution, and the method comprises the following steps: (a) binding the nucleic acids to the nucleic acid-binding phase at a pH which is below the pH of the pK of the nucleic acid-binding groups A (binding pH); (b) eluting the nucleic acids at a pH which is above the binding pH (elution pH). In addition, corresponding kits and also nucleic acid-binding phases which can be used for purifying nucleic acids are disclosed. The technology according to the invention permits the purification of nucleic acids and, in particular, elution, with use of low salt concentrations, and so the purified nucleic acids can be directly processed, for example used in a PCR.
    本发明涉及一种利用具有pK值为8至13的核酸结合基团A的核酸结合相或具有在结合期间和最好在洗脱期间呈中性电荷的基团A和结合抑制基团N的核酸结合相来纯化核酸的方法,该方法包括以下步骤:(a)在低于核酸结合基团A的pK值的pH下(结合pH)将核酸结合到核酸结合相上;(b)在高于结合pH的pH下(洗脱pH)洗脱核酸。此外,还公开了相应的用于纯化核酸的试剂盒和核酸结合相。根据本发明的技术允许纯化核酸,特别是在低盐浓度下进行洗脱,因此纯化的核酸可以直接处理,例如用于PCR。
  • FLUIDE DE FORAGE COMPRENANT UN POLYMERE ET UTILISATION DU POLYMERE DANS UN FLUIDE DE FORAGE
    申请人:RHODIA CHIMIE
    公开号:EP1891179B1
    公开(公告)日:2013-04-24
  • Zwitterionic Polymers Comprising Betaine-Type Units And Use Of Zwitterionic Polymers In Drilling Fluids
    申请人:Karagianni Katerina
    公开号:US20080045420A1
    公开(公告)日:2008-02-21
    The invention relates to novel polymers comprising betaine-type units and to the use of zwitterionic polymers in drilling fluids, for example, as a clay swelling inhibitor and/or as an accretion-inhibiting agent and/or as a fluid-rheology-controlling agent and/or a filtrate-reducing agent and/or a lubricant.
  • NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
    申请人:Shirakawa Koji
    公开号:US20080241745A1
    公开(公告)日:2008-10-02
    A negative resist composition, includes: (A) an alkali-soluble polymer containing a specific repeating unit as defined in the specification; (B) a crosslinking agent capable of crosslinking with the alkali soluble polymer (A) under an action of an acid; (C) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (D) a specific quaternary ammonium salt as defined in the specification; and (E) an organic carboxylic acid, and a pattern forming method uses the composition.
  • Coating-type underlayer coating forming composition for lithography containing vinylnaphthalene resin derivative
    申请人:Sakaguchi Takahiro
    公开号:US20090253076A1
    公开(公告)日:2009-10-08
    [Object] To provide a coating-type underlayer coating forming composition that is applied for multi-ply coating process by thin film resist in order to prevent collapse of resist pattern after development with miniaturization of resist pattern, and that shows a sufficient etching resistance against a semiconductor substrate to be processed on processing of the substrate by having a low dry etching rate compared with the photoresist and substrate. [Means for solving problems] A coating-type underlayer coating forming composition that is used for lithography process by multiply coating, comprising a polymer containing a vinylnaphthalene based structural unit and an acrylic acid based structural unit containing an aromatic hydroxy group or a hydroxy-containing ester. A coating-type underlayer coating forming composition further comprising an acrylic acid based structural unit containing an aliphatic cyclic compound-containing ester or an aromatic compound-containing ester.
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