申请人:Rohm and Haas Company
公开号:US04131736A1
公开(公告)日:1978-12-26
The present invention is concerned with novel monomers containing sulfonic acid groups or salts thereof and polymers thereof which are useful for many purposes, such as antistatic agents for textiles and other shaped articles formed of hydrophilic materials. They are useful for making copolymers that are particularly valuable in coating compositions, especially in the form of aqueous latices or organic solvent solutions thereof. Examples of the monomers are of the formula ##STR1## wherein R is hydrogen or lower (C.sub.1 -C.sub.4)alkyl, such as methyl, A is an alkylene group having 2 to 10 carbon atoms, at least 2 of which extend in one chain between the oxygen atoms, and X is an aromatic nucleus or an alkyl group, substituted by a sulfonic acid group and optionally one or more groups selected from sulfonic acid, carboxylic acid, and lower alkyl, such as methyl, ethyl, propyl, or butyl.
本发明涉及含有磺酸基或其盐的新型单体及其聚合物,可用于许多用途,例如作为纺织品和其他由亲水性材料形成的成型物的抗静电剂。它们可用于制备共聚物,在涂料组合物中特别有价值,特别是以水乳液或有机溶剂溶液的形式。其中单体的示例为公式##STR1##其中R为氢或较低的(C.sub.1-C.sub.4)烷基,例如甲基,A为具有2到10个碳原子的烷基,其中至少有2个延伸在氧原子之间的链上,而X则为芳香族核或烷基,通过磺酸基和可选地选择自磺酸基,羧酸基和较低的烷基,例如甲基,乙基,丙基或丁基进行取代。