4,4a(2)-[1,3-Phenylenebis(1-methylethylidene)]bis[2-cyclohexyl-5-methylphenol] | 152305-90-3

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二芳基庚烷
• 英文名称: 4,4a(2)-[1,3-Phenylenebis(1-methylethylidene)]bis[2-cyclohexyl-5-methylphenol]
• 英文别名: 2-cyclohexyl-4-[2-[3-[2-(5-cyclohexyl-4-hydroxy-2-methylphenyl)propan-2-yl]phenyl]propan-2-yl]-5-methylphenol
• CAS: 152305-90-3
• 化学式: C₃₈H₅₀O₂
• 分子量: 538.8
• InChiKey: QVKCETDLMGAEMI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  12.6
• 重原子数：
  40
• 可旋转键数：
  6
• 环数：
  5.0
• sp3杂化的碳原子比例：
  0.53
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  2

文献信息

• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。
• Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：EP0902326A2

  公开（公告）日：1999-03-17

  A novolak resin precursor is composed of bonded phenolic moieties, one of the hydrogen atoms in the o- or p-positions relative to the hydroxy group of each phenolic moiety is substituted with an alkyl or alkenyl group having 1 to 3 carbon atoms, and the other two hydrogen atoms are bonded through methylene bonds. The content of ortho-ortho bonding is 30 to 70% relative to the number of total methylene bonds and the weight average molecular weight of the precursor is 300 to 10,000. A novolak resin is obtained from this precursor, and a positive photoresist composition comprises this novolak resin. The invention provides a positive photoresist composition that comprises less binuclear compounds, suppresses scum formation, is excellent in terms of definition and coating performance and provides a resist pattern having satisfactory heat resistance.

  一种新酚醛树脂前体由键合的酚基组成，每个酚基的 o 位或 p 位上相对于羟基的一个氢原子被具有 1 至 3 个碳原子的烷基或烯基取代，另外两个氢原子通过亚甲基键键合。相对于亚甲基键总数，正交-正交键的含量为 30%至 70%，前体的重量平均分子量为 300 至 10,000。从这种前体中可以得到一种酚醛树脂，一种正性光刻胶组合物就包含这种酚醛树脂。本发明提供的正性光刻胶组合物含有较少的双核化合物，可抑制浮渣的形成，具有优异的清晰度和涂布性能，并提供具有令人满意的耐热性的抗蚀图案。
• OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION
  申请人：Kansai Research Institute, Inc.

  公开号：EP1375463A1

  公开（公告）日：2004-01-02

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1):         A-[(J)m-(X-Pro)]n     (1)    wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  光活性化合物与光敏剂结合使用，光敏剂由下式（1）表示： A-[(J)m-(X-Pro)]n (1) 其中 A 代表疏水单元，包括至少一种选自烃基和杂环基的疏水基团；J 代表连接基团；X-Pro 代表亲水基团，该亲水基团受保护基团 Pro 的保护，该保护基团可通过光照去除；m 代表 0 或 1；n 代表不小于 1 的整数。 保护基 Pro 可以通过与光敏剂（特别是光酸发生器）一起进行光照射而去除，也可以是疏水保护基。亲水基团可以是羟基或羧基。光活性化合物对短波长光束的光源具有很高的灵敏度，因此在抗蚀剂应用中，光活性化合物可用于形成具有高分辨率的图案。
• POLYCARBONATE RESIN AND OPTICAL FILM USING THE SAME
  申请人：MITSUBISHI GAS CHEMICAL COMPANY, INC.

  公开号：EP2053072A1

  公开（公告）日：2009-04-29

  According to the present invention, a polycarbonate resin having a repeat unit represented by the following formula (1) and a repeat unit represented by the following general formula (2), and an optical film using the same, can be provided. In the formula, Y is a cycloalkylene group having a carbon number of 4 through 20 or a structure represented by the following general formula (3). In the general formula (3), R1, R2, R3 and R4 are independently a hydrogen atom or a monovalent alkyl group having a carbon number of 1 through 5.

  根据本发明，可以提供一种具有下式（1）代表的重复单元和下式（2）代表的重复单元的聚碳酸酯树脂，以及使用该树脂的光学薄膜。 式中，Y 是碳原子数为 4 至 20 的环亚烷基，或下式（3）所代表的结构。 在通式（3）中，R1、R2、R3 和 R4 独立地为氢原子或碳原子数为 1 至 5 的单价烷基。
• Photosensitive compositions and applications thereof
  申请人：PROMERUS, LLC

  公开号：US11537045B2

  公开（公告）日：2022-12-27

  The present invention relates to photosensitive compositions containing polynorbornene (PNB) polymers and certain additives that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PNBs and certain multifunctional crosslinking agents, and two or more phenolic compounds which are resistant to thermo-oxidative chain degradation and exhibit improved mechanical properties.

  本发明涉及含有聚降冰片烯（PNB）聚合物和某些添加剂的光敏组合物，这些组合物可用于形成微电子和/或光电器件及其组件，更具体地说，本发明涉及包含 PNB 和某些多功能交联剂以及两种或两种以上酚类化合物的组合物，这些组合物可抗热氧化链降解，并具有更好的机械性能。