4-t-butylphenyl.diphenylsulfonium pyrenesulfonate | 923262-17-3

• 分子结构分类: 有机化合物 - 苯类化合物 - 芘
• 英文名称: 4-t-butylphenyl.diphenylsulfonium pyrenesulfonate
• 英文别名: (4-tert-Butylphenyl)(diphenyl)sulfanium pyrene-1-sulfonate；(4-tert-butylphenyl)-diphenylsulfanium;pyrene-1-sulfonate
• CAS: 923262-17-3
• 化学式: C₁₆H₉O₃S*C₂₂H₂₃S
• 分子量: 600.802
• InChiKey: JYDUADMZYBVVKA-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  9.57
• 重原子数：
  43
• 可旋转键数：
  4
• 环数：
  7.0
• sp3杂化的碳原子比例：
  0.11
• 拓扑面积：
  66.6
• 氢给体数：
  0
• 氢受体数：
  3

文献信息

• [EN] A CHEMO-ENZYMATIC APPROACH TO THE SYNTHESIS OF PIMECROLIMUS<br/>[FR] APPROCHE CHIMIOENZYMATIQUE À LA SYNTHÈSE DE PIMÉCROLIMUS
  申请人：POLI IND CHIMICA SPA

  公开号：WO2010134027A1

  公开（公告）日：2010-11-25

  Processes for preparing pimecrolimus starting from ascomycin, exploiting the selectivity characteristics of the purified enzymatic systems particularly regarding the selective functionalization of the hydroxyl groups present in position 24 and 33 of ascomycin. Such method represents the first example of chemoenzymatic synthesis for preparing pimecrolimus.

  从曲霉素开始制备皮米克罗霉素的过程，利用纯化酶系统的选择性特征，特别是关于曲霉素中24号和33号位置的羟基基团的选择性官能化。这种方法代表了制备皮米克罗霉素的化学酶合成的第一个示例。
• Novel carbazole derivative and chemically amplified radiation-sensitive resin composition
  申请人：——

  公开号：US20020172885A1

  公开（公告）日：2002-11-21

  A carbazole derivative of the following formula (1), 1 wherein R 1 and R 2 individually represent a hydrogen atom or a monovalent organic group, or R 1 and R 2 form, together with the carbon atom to which R 1 and R 2 bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R 3 represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.

  以下是该段文字的中文翻译： 一种具有以下式（1）的咔唑衍生物，其中R1和R2分别代表氢原子或一价有机基团，或者R1和R2与其结合的碳原子一起形成具有3-8个成员碳环结构或3-8个成员杂环结构的二价有机基团，R3代表氢原子或一价有机基团。该咔唑衍生物适用作为增加化学增感抗蚀性的添加剂。还公开了一种化学增感辐射敏感树脂组合物，该组合物用作化学增感抗蚀剂，包括该咔唑衍生物。
• Novel anthracene derivative and radiation-sensitive resin composition
  申请人：——

  公开号：US20030194634A1

  公开（公告）日：2003-10-16

  A novel anthracene derivative useful as an additive to a radiation-sensitive resin composition is disclosed. The anthracene derivative has the following formula (1), 1 wherein R 1 groups individually represent a hydroxyl group or a monovalent organic group having 1-20 carbon atoms, n is an integer of 0-9, X is a single bond or a divalent organic group having 1-12 carbon atoms, and R 2 represents a monovalent acid-dissociable group. The radiation-sensitive resin composition comprises the anthracene derivative of the formula (1), a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble in the presence of an acid, and a photoacid generator. The composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays, typified by a KrF excimer laser and ArF excimer laser.

  揭示了一种作为辐射敏感树脂组合物添加剂有用的新型蒽衍生物。该蒽衍生物具有以下化学式（1），其中R1基分别表示一个羟基或具有1-20个碳原子的一价有机基团，n是0-9的整数，X是一个单键或具有1-12个碳原子的二价有机基团，R2表示一价酸可解离基团。辐射敏感树脂组合物包括化学式（1）的蒽衍生物，一种在碱性条件下不溶或几乎不溶但在存在酸时变为碱溶的树脂，以及光酸发生剂。该组合物可用作化学放大光刻胶，用于利用KrF准分子激光和ArF准分子激光等深紫外线进行微加工。
• Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition
  申请人：——

  公开号：US20030113658A1

  公开（公告）日：2003-06-19

  A novel photoacid generator containing a structure of the following formula (I), 1 wherein R is a monovalent organic group with a fluorine content of 50 wt % or less, a nitro group, a cyano group, or a hydrogen atom, and Z 1 and Z 2 are individually a fluorine atom or a linear or branched perfluoroalkyl group having 1-10 carbon atoms, is provided. When used in a chemically amplified radiation-sensitive resin composition, the photoacid generator exhibits high transparency, comparatively high combustibility, and no bioaccumulation, and produces an acid exhibiting high acidity, high boiling point, moderately short diffusion length in the resist coating, and low dependency to mask pattern density.

  提供一种新型光酸发生剂，其含有以下式(I)的结构，其中R是一种具有50重量％或以下氟含量，硝基，氰基或氢原子的一价有机基团，Z1和Z2分别是氟原子或具有1-10个碳原子的线性或支链全氟烷基团。当用于化学增感辐射敏感树脂组成物中时，该光酸发生剂表现出高透明度，相对高的可燃性和无生物积累，并产生具有高酸度，高沸点，适度短的扩散长度在抗蚀涂层中，并且对掩模图案密度的依赖性低的酸。
• Radiation-sensitive resin composition
  申请人：JSR Corporation

  公开号：EP1164433A1

  公开（公告）日：2001-12-19

  A positive-type radiation-sensitive resin composition is provided. The composition includes: (A) a low-molecular compound comprising a compound having at least one amino group having one or two hydrogen atom(s) bonded to the nitrogen atom; at least one hydrogen atom the amino group has having been substituted with a t-butoxycarbonyl group; (B) a radiation-sensitive acid generator; and (C) a silicon-atom-containing resin comprising an alkali-insoluble or alkali-slightly-soluble resin having been protected with an acid-cleavable group; the resin being capable of turning soluble in alkali upon cleavage of the acid-cleavable group. This radiation-sensitive resin composition is effectively responsive to radiations of various types, has superior sensitivity and resolution and also a superior long-term storage stability, and is useful as a positive-type chemically amplified resist.

  提供了一种正型辐射敏感树脂组合物。该组合物包括 (A) 一种低分子化合物，该化合物含有至少一个氨基，氨基上有一个或两个氢原子与氮原子结合；氨基上的至少一个氢原子被一个叔丁氧羰基取代； (B) 辐射敏感酸发生器；以及 (C) 含硅原子的树脂，该树脂由碱不溶性或碱微溶性树脂组成，并用酸可裂解基团保护；该树脂在酸可裂解基团裂解后可溶于碱。这种辐射敏感树脂组合物能有效地对各种类型的辐射做出反应，具有极高的灵敏度和分辨率，以及极佳的长期储存稳定性，可用作正型化学放大抗蚀剂。