1,2,3-Anthracenetriol

• 分子结构分类: 有机化合物 - 苯类化合物 - 蒽
• 英文名称: 1,2,3-Anthracenetriol
• 英文别名: anthracene-1,2,3-triol
• 化学式: C₁₄H₁₀O₃
• 分子量: 226.23
• InChiKey: SLOLMTWBBAFOKJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.4
• 重原子数：
  17
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  60.7
• 氢给体数：
  3
• 氢受体数：
  3

文献信息

• COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMATION METHOD
  申请人：MITSUBISHI GAS CHEMICAL COMPANY, INC.

  公开号：US20200249573A1

  公开（公告）日：2020-08-06

  The present invention provides a composition for resist underlayer film formation comprising a tellurium-containing compound or a tellurium-containing resin.

  本发明提供了一种用于抗蚀底层膜形成的组合物，其包括含碲化合物或含碲树脂。
• OPTICAL COMPONENT FORMING COMPOSITION AND CURED PRODUCT THEREOF
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20200262787A1

  公开（公告）日：2020-08-20

  The present invention provides an optical component forming composition comprising a tellurium-containing compound or a tellurium-containing resin.

  本发明提供了一种包括含碲化合物或含碲树脂的光学元件成型组合物。
• [EN] 1,4-HYDROQUINONE FUNCTIONALIZED PHOSPHYNATES AND PHOSPHONATES<br/>[FR] PHOSPHINATES ET PHOSPHONATES FONCTIONNALISÉS PAR DES GROUPEMENTS DE TYPE 1,4-HYDROQUINONE
  申请人：CHEMTURA CORP

  公开号：WO2006034445A1

  公开（公告）日：2006-03-30

  There is presented novel 1,4-hydroquinone derivatized phosphinates and phosphonates. The novel compositions here presented are useful as polymer curing agents and as flame retardants. Where R, R’ each independently are the same or different aryl, aralkyl or alkyl comprising from one to 15 carbon atoms.

  提供了新颖的1,4-羟基苯醌衍生的膦酸酯和膦酸盐。这里提供的新颖组合物可用作聚合物固化剂和阻燃剂。其中，R和R'各自独立地是相同或不同的含有1至15个碳原子的芳基、芳基烷基或烷基。
• BORON CONTAINING ORGANIC/HYBRID SCINTILLATION MATERIALS FOR GAMMA AND NEUTRON DETECTION
  申请人：Sellinger Alan

  公开号：US20160178766A1

  公开（公告）日：2016-06-23

  The invention is directed to a method for making a boron containing compound, a method for making a plastic scintillator and a method for forming a neutron detecting material, and the materials made therein. Methods of use are also disclosed.

  这项发明涉及制备含硼化合物的方法，制备塑料闪烁体的方法以及形成中子探测材料的方法，以及在其中制造的材料。还公开了使用方法。
• BIPHENYL DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, BOTTOM LAYER FORMING METHOD, AND PATTERNING PROCESS
  申请人：Kori Daisuke

  公开号：US20120252218A1

  公开（公告）日：2012-10-04

  A biphenyl derivative having formula (1) is provided wherein Ar1 and Ar2 denote a benzene or naphthalene ring, and x and z each are 0 or 1. A material comprising the biphenyl derivative or a polymer comprising recurring units of the biphenyl derivative is spin coated and heat treated to form a resist bottom layer having improved properties, optimum values of n and k, step coverage, etch resistance, heat resistance, solvent resistance, and minimized outgassing.

  提供公式（1）的二苯基衍生物，其中Ar1和Ar2表示苯环或萘环，x和z各自为0或1。含有该二苯基衍生物的材料或含有该二苯基衍生物重复单元的聚合物被旋涂并经热处理，以形成具有改进性能、最佳值的n和k、阶梯覆盖、蚀刻抗性、耐热性、耐溶剂性和最小化气体放出的抗蚀底层。