The present invention provides a composition for preparing porous dielectric thin film containing pore-generating material, said composition comprising gemini detergent, fourth alkylammonate, thermo-stable organic or inorganic matrix precursor, and solvent for dissolving said two solid components. There is also provided an interlayer insulating film having good mechanical property such as hardness, modulus and hydroscopicity, which is required for semiconductor devices.
本发明提供了一种用于制备含有孔隙生成材料的多孔介质薄膜的组合物,所述组合物包括双子洗涤剂、第四烷基
铵盐、热稳定有机或无机基质前体以及用于溶解所述两种固体成分的溶剂。此外,还提供了一种层间绝缘薄膜,它具有良好的机械性能,如硬度、模量和吸湿性,这是半导体器件所需要的。