2-Propenoic acid, 4-[(4-hydroxyphenyl)sulfonyl]phenyl ester | 112250-58-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯酚酯
• 英文名称: 2-Propenoic acid, 4-[(4-hydroxyphenyl)sulfonyl]phenyl ester
• 英文别名: [4-(4-hydroxyphenyl)sulfonylphenyl] prop-2-enoate
• CAS: 112250-58-5
• 化学式: C₁₅H₁₂O₅S
• 分子量: 304.3
• InChiKey: OPLPHDDLZMCMNX-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.7
• 重原子数：
  21
• 可旋转键数：
  5
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  89
• 氢给体数：
  1
• 氢受体数：
  5

文献信息

• Anti-reflective coating composition, multilayer photoresist material using the same, and method for forming pattern
  申请人：——

  公开号：US20020055064A1

  公开（公告）日：2002-05-09

  Disclosed is an anti-reflective coating composition for forming an anti-reflective coating as an undercoating layer is provided, comprising a crosslinking agent, which is at least one compound selected from nitrogen-containing compounds having an amino group(s) and/or an imino group(s) at least two hydrogen atoms of which are substituted by a hydroxyalkyl group(s) and/or an alkoxyalkyl group(s), and an acidic compound, wherein the crosslinking agent is such that the proportion of its low-molecular-weight component not larger than a trimer is adjusted to be 15 wt % or less; a multilayer photoresist material using the composition; and a method for forming a pattern. According to the present invention, even in the formation of a hyperfine pattern, it is possible to provide a photoresist pattern having a rectangular cross-sectional profile in relation to the substrate without causing any undesirable phenomena, such as footing, undercutting, etc. at is bottom.

  本发明公开了一种用于形成作为底涂层的减反射涂层的减反射涂层组合物，该组合物包含一种交联剂，该交联剂是至少一种选自具有氨基和/或亚氨基的含氮化合物的化合物，其至少两个氢原子被羟基烷基和/或烷氧基烷基取代、和一种酸性化合物，其中交联剂应使其不大于三聚体的低分子量组分的比例调整为 15 wt % 或更少；使用该组合物的多层光阻材料；以及形成图案的方法。根据本发明，即使在形成超细图案的过程中，也可以提供相对于基底具有矩形横截面轮廓的光刻胶图案，而不会在底部造成任何不良现象，如底脚、下切等。
• US6689535B2
  申请人：——

  公开号：US6689535B2

  公开（公告）日：2004-02-10