CLEANING COMPOSITION AND METHOD OF MANUFACTURING METAL WIRING USING THE SAME
申请人:Samsung Display Co., Ltd.
公开号:US20150136728A1
公开(公告)日:2015-05-21
A cleaning composition includes about 0.01 to about 5 wt % of a chelating agent; about 0.01 to about 0.5 wt % of an organic acid; about 0.01 to about 1.0 wt % of an inorganic acid; about 0.01 to about 5 wt % of an alkali compound; and deionized water.
US9340759B2
申请人:——
公开号:US9340759B2
公开(公告)日:2016-05-17
US9869027B2
申请人:——
公开号:US9869027B2
公开(公告)日:2018-01-16
Huddleston, Patrick R.; Barker, John M.; Adamczewska, Yolante Z., Journal of Chemical Research, Miniprint, 1993, # 2, p. 548 - 575
作者:Huddleston, Patrick R.、Barker, John M.、Adamczewska, Yolante Z.、Wood, Michael L.、Holmes, David