1,2-dimethoxy-3-propoxy-propane

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 甘油脂
• 英文名称: 1,2-dimethoxy-3-propoxy-propane
• 英文别名: Glycerin-α.β-dimethylaether-α'-propylaether；1,2-Dimethoxy-3-propoxy-propan；1,2-Dimethoxy-3-propoxypropane；1,2-dimethoxy-3-propoxypropane
• 化学式: C₈H₁₈O₃
• 分子量: 162.229
• InChiKey: APNRXUGYMCCUNF-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.7
• 重原子数：
  11
• 可旋转键数：
  7
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  27.7
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  (1Z)-2-吡啶-4-基乙脒 、 碘甲烷 在 sodium 、 苯 作用下， 生成 1,2-dimethoxy-3-propoxy-propane
  参考文献：
  名称：

  DE226454

  摘要：

  公开号：

文献信息

• Method for providing higher molecular weight natural oil polyols without loss of functionality
  申请人：Garrett Thomas M

  公开号：US20120116043A1

  公开（公告）日：2012-05-10

  Methods of one-pot synthesis of high molecular weight natural oil polyols having a functionality of at least two are provided. The resultant polyols may be directly reacted with polyisocyanates to produce polyurethanes.

  提供了一种一锅法合成至少具有双官能团的高分子量天然油聚醇的方法。所得的聚醇可以直接与聚异氰酸酯反应以产生聚氨酯。
• Silicon-containing resist underlayer film-forming composition and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP2599818A1

  公开（公告）日：2013-06-05

  The present invention is a silicon-containing resist underlayer film-forming composition containing a condensation product and/or a hydrolysis condensation product of a mixture comprising: one or more kinds of a compound (A) selected from the group consisting of an organic boron compound shown by the general formula (1) and a condensation product thereof and one or more kinds of a silicon compound (B) shown by the general formula (2). Thereby, there can be provided a silicon-containing resist underlayer film-forming composition being capable of forming a pattern having a good adhesion, forming a silicon-containing film which can be used as a dry-etching mask between a photoresist film which is the upperlayer film of the silicon-containing film and an organic film which is the underlayer film thereof, and suppressing deformation of the upperlayer resist during the time of dry etching of the silicon-containing film; and a patterning process.         R1m0B(OH)m1(OR)(3-m0-m1)     (1)         R10m10R11m11R12m12Si(OR13)(4-m10-m11-m12)     (2)

  本发明是一种含硅抗蚀剂底层成膜组合物，它含有以下混合物的缩合产物和/或水解缩合产物：一种或多种选自通式（1）所示有机硼化合物及其缩合产物的化合物（A）和一种或多种通式（2）所示硅化合物（B）。因此，可以提供一种含硅抗蚀剂底层成膜组合物，该组合物能够形成具有良好附着力的图案，在作为含硅薄膜的上层薄膜的光刻胶薄膜和作为其底层薄膜的有机薄膜之间形成可用作干蚀刻掩膜的含硅薄膜，并在干蚀刻含硅薄膜时抑制上层抗蚀剂的变形；还可以提供一种图案化工艺。 R1m0B(OH)m1(OR)(3-m0-m1) (1) R10m10R11m11R12m12Si(OR13)(4-m10-m11-m12) (2)
• STABLE PHARMACEUTICAL COMPOSITIONS OF PEPTIDE DERIVATIZED USING AN OXIME LINKER
  申请人：Reslow Mats

  公开号：US20120108512A1

  公开（公告）日：2012-05-03

  The invention relates to stable pharmaceutical compositions comprising a therapeutic peptide derivatized with a property-modifying group, wherein the property-modifying group is conjugated to the peptide by use of a linker comprising an oxime bond.
• SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20130137041A1

  公开（公告）日：2013-05-30

  The present invention is a silicon-containing resist underlayer film-forming composition containing at least any one of a condensation product and a hydrolysis condensation product or both of a mixture comprising: one or more kinds of a compound (A) selected from the group consisting of an organic boron compound shown by the following general formula (1) and a condensation product thereof and one or more kinds of a silicon compound (B) shown by the following general formula (2). Thereby, there can be provided a resist underlayer film applicable not only to the resist pattern formed of a hydrophilic organic compound obtained by the negative development but also to the resist pattern formed of a hydrophobic compound obtained by the conventional positive development. R 1 m0 B(OH) m1 (OR) (3-m0-m1) (1) R 10 m10 R 11 m11 R 12 m12 Si(OR 13 ) (4-m10-m11-m12) (2)
• COMPOSITION FOR FORMING A COATING TYPE SILICON-CONTAINING FILM, SUBSTRATE, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20160096977A1

  公开（公告）日：2016-04-07

  A composition for forming a coating type silicon-containing film, containing one or more silicic acid skeletal structures represented by the formula (1) and one or more silicon skeletal structures represented by the formula (2), wherein the composition contains a coupling between units shown in the formula (2). There can be provided a composition capable of forming a silicon-containing film that has excellent adhesiveness in fine patterning, and can be easily wet etched by a removing liquid which does not cause damage to a semiconductor substrate and a coating type organic film or a CVD film mainly of carbon which is required in the patterning process.