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1-(2,2-difluoroethyl)adamantane

中文名称
——
中文别名
——
英文名称
1-(2,2-difluoroethyl)adamantane
英文别名
——
1-(2,2-difluoroethyl)adamantane化学式
CAS
——
化学式
C12H18F2
mdl
——
分子量
200.272
InChiKey
AXOKWHRBQYZNAB-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    4.9
  • 重原子数:
    14
  • 可旋转键数:
    2
  • 环数:
    4.0
  • sp3杂化的碳原子比例:
    1.0
  • 拓扑面积:
    0
  • 氢给体数:
    0
  • 氢受体数:
    2

反应信息

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文献信息

  • Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same
    申请人:Shigematsu Junji
    公开号:US20080086014A1
    公开(公告)日:2008-04-10
    The present invention provides a salt represented by the formula (I): wherein X represents a C3-C30 divalent group containing at least one divalent alicyclic hydrocarbon group, and at least one —CH 2 — in the C3-C30 divalent group may be substituted with —O— or —CO—, Y represents a C3-C30 cyclic hydrocarbon group which may be substituted with at least one group selected from a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group and a cyano group, and at least one —CH 2 — in the C3-C30 cyclic hydrocarbon group may be substituted with —O— or —CO—, Q 1 and Q 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A + represents an organic counter ion.
    本发明提供了一种由公式(I)表示的盐:其中X代表含至少一个二价脂环烃基的C3-C30二价基团,并且C3-C30二价基团中的至少一个—CH2—可以被—O—或—CO—取代,Y代表一个C3-C30环烃基,该环烃基可以至少被选自C1-C6烷氧基、C1-C4全氟烷基、C1-C6羟基烷基、羟基和氰基的至少一个取代基取代,并且C3-C30环烃基中的至少一个—CH2—可以被—O—或—CO—取代,Q1和Q2各自独立地代表一个氟原子或一个C1-C6全氟烷基,以及A+代表一个有机反离子。
  • PATTERN FORMING METHOD USING DEVELOPER CONTAINING ORGANIC SOLVENT AND RINSING SOLUTION FOR USE IN THE PATTERN FORMING METHOD
    申请人:Kamimura Sou
    公开号:US20110229832A1
    公开(公告)日:2011-09-22
    A pattern forming method, includes: (i) a step of forming a resist film from a resist composition for organic solvent-based development, the resist composition containing (A) a resin capable of increasing a polarity by an action of an acid to decrease a solubility in an organic solvent-containing developer and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) an exposure step; (iii) a development step using an organic solvent-containing developer; and (iv) a washing step using a rinsing solution, wherein in the step (iv), a rinsing solution containing at least either the solvent S 1 or S 2 as defined in the specification is used.
  • ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
    申请人:FUJIFILM Corporation
    公开号:US20160347897A1
    公开(公告)日:2016-12-01
    The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a resin (P) including a repeating unit (i) having a group which decomposes by the action of an acid represented by the following General Formula (1), a pattern forming method using the composition, a method for manufacturing an electronic device, and an electronic device.
  • US7667050B2
    申请人:——
    公开号:US7667050B2
    公开(公告)日:2010-02-23
  • Copper-Catalyzed Decarboxylative Difluoromethylation
    作者:Xiaojun Zeng、Wenhao Yan、Samson B. Zacate、Tzu-Hsuan Chao、Xiaodong Sun、Zhi Cao、Kate G. E. Bradford、Matthew Paeth、Sam B. Tyndall、Kundi Yang、Tung-Chun Kuo、Mu-Jeng Cheng、Wei Liu
    DOI:10.1021/jacs.9b05363
    日期:2019.7.24
    We report herein a highly efficient Cu-catalyzed protocol for the conversion of aliphatic carboxylic acids to the corresponding difluoromethylated analogues. This robust, operationally simple and scalable protocol tolerates a variety of functional groups and can convert a diverse array of acid-containing complex molecules to the alkyl-CF2H products. Mechanistic studies support the involvement of alkyl
    我们在此报告了一种高效的铜催化方案,用于将脂肪族羧酸转化为相应的二氟甲基化类似物。这种稳健、操作简单且可扩展的协议可以容忍多种官能团,并且可以将各种含酸的复杂分子转化为烷基-CF2H 产品。机理研究支持烷基自由基的参与。
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