申请人:Motoyoshi Tetsuya
公开号:US20110288261A1
公开(公告)日:2011-11-24
The object of this invention is to provide an optical film formed of a copolycarbonate having a desired chromatic dispersion and low photoelasticity and having excellent melt processability.
The optical film comprises a copolycarbonate composed of 25 to 90 mol % of unit (A) of the following formula,
wherein each of R
1
and R
2
is independently a hydrogen atom, a hydrocarbon group having 1 to 10 carbon atoms or a halogen atom, each of R
3
and R
4
is independently a hydrocarbon group having 1 to 10 carbon atoms, each of m and n is independently an integer of 0 to 4, and each of p and q is independently an integer of 0 or more,
and 10 to 75 mol % of unit (B) of the following formula,
wherein R
a
is a monocyclic or polycyclic alicyclic hydrocarbon group having 4 to 20 carbon atoms, the alicyclic hydrocarbon group may contain a hetero atom or may have a bridge structure, and q is 0 or 1,
the optical film satisfying the following expression (1),
R
(450)<
R
(550)<
R
(650) (1)
wherein R(450), R(550) and R(650) are in-plane retardation values of the film at wavelengths of 450 nm, 550 nm and 650 nm.
本发明的目的是提供一种光学薄膜,其由具有所需色散和低光弹性以及优异的熔融加工性的共聚碳酸酯形成。该光学薄膜包括由以下式中25至90摩尔%的(A)单元组成的共聚碳酸酯,其中R1和R2各自独立地为氢原子,具有1至10个碳原子的烃基或卤素原子,R3和R4各自独立地为具有1至10个碳原子的烃基,m和n各自独立地为0至4的整数,p和q各自独立地为0或更多的整数,并且由以下式中10至75摩尔%的(B)单元组成,其中Ra是具有4至20个碳原子的单环或多环脂环烃基,脂环烃基可以含有杂原子或具有桥式结构,q为0或1,该光学薄膜满足以下式(1),R(450)
OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION
申请人:Kansai Research Institute, Inc.
公开号:EP1375463A1
公开(公告)日:2004-01-02
A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1):
A-[(J)m-(X-Pro)]n (1)
wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1.
The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.
光活性化合物与光敏剂结合使用,光敏剂由下式(1)表示:
A-[(J)m-(X-Pro)]n (1)
其中 A 代表疏水单元,包括至少一种选自烃基和杂环基的疏水基团;J 代表连接基团;X-Pro 代表亲水基团,该亲水基团受保护基团 Pro 的保护,该保护基团可通过光照去除;m 代表 0 或 1;n 代表不小于 1 的整数。
保护基 Pro 可以通过与光敏剂(特别是光酸发生器)一起进行光照射而去除,也可以是疏水保护基。亲水基团可以是羟基或羧基。光活性化合物对短波长光束的光源具有很高的灵敏度,因此在抗蚀剂应用中,光活性化合物可用于形成具有高分辨率的图案。
AROMATIC COMPOUND HAVING FLUORENE SKELETON AND POLYARYLENE HAVING SULFONIC ACID GROUP
申请人:JSR Corporation
公开号:EP2011812A1
公开(公告)日:2009-01-07
Sulfonated polyarylenes have excellent processability and methanol resistance.
The polyarylene includes a structural unit (S) represented by Formula (2-2) below and a structural unit (T) represented by Formula (2-3) below, the structural unit (S) accounting for a proportion "s" of 95 to 50 mol%, the structural unit (T) accounting for a proportion "t" of 5 to 50 mol% ("s"+ "t" = 100 mol%) :
wherein each A independently represents a divalent linking group represented by -CO- or -SO2-; and R1 to R4 each independently represent a hydrogen atom, a fluorine atom, an alkyl group or an aryl group.
磺化聚芳基烯具有优异的加工性和耐甲醇性。
聚芳基烯包括下式(2-2)表示的结构单元(S)和下式(2-3)表示的结构单元(T),结构单元(S)所占比例 "s "为 95 至 50 摩尔%,结构单元(T)所占比例 "t "为 5 至 50 摩尔%("s "+"t"=100 摩尔%):
其中,每个 A 独立地代表由 -CO- 或 -SO2- 表示的二价连接基团;R1 至 R4 各自独立地代表氢原子、氟原子、烷基或芳基。
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