申请人:UNION CARBIDE CORPORATION
公开号:EP0291889A1
公开(公告)日:1988-11-23
A process is provided for the preparation of the dimer, dichloro-[2,2]paracyclophane, which is useful as the starting material for the deposition of conformal parylene coatings employed, for example, in the electronics industry for the protection of various sensitive electronic components.
The process avoids the normally low yields of chlorinated dimer formed by the chlorination of 2,2-paracycophane and instead utilizes the Hofmann elimination of 2(3)-chloro-p-methylbenzyltrimethylammonium hydroxide by conducting the elimination reaction under carefully controlled conditions of reaction temperature and profile, reaction feed configuration, water concentration in the reactor and the use of a cosolvent, certain reaction promoters, or a combination thereof.
本发明提供了一种制备二聚体二氯-[2,2]对位二环氧乙烷的工艺,这种二聚体可用作沉积保形对位二甲苯涂层的起始材料,例如在电子工业中用于保护各种敏感的电子元件。
该工艺避免了 2,2-对位二茂烷基氯化形成的氯化二聚物的低产率,而是利用 2(3)-chloro-p-methylbenzyltrimethylammonium hydroxide 的霍夫曼消去反应,在仔细控制反应温度和温度曲线、反应进料配置、反应器中水浓度以及共溶剂、某些反应促进剂或其组合的使用条件下进行消去反应。