sodium 4-(4'-methylphenylsulfonyloxy)benzenesulfonate

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: sodium 4-(4'-methylphenylsulfonyloxy)benzenesulfonate
• 英文别名: sodium 4-tosyloxybenzenesulphonate；sodium p-tosylated benzenesulfate；Sodium;4-(4-methylphenyl)sulfonyloxybenzenesulfonate
• 化学式: C₁₃H₁₁O₆S₂*Na
• 分子量: 350.349
• InChiKey: WDTKSTUUNSHHQU-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  -1.33
• 重原子数：
  22
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.08
• 拓扑面积：
  117
• 氢给体数：
  0
• 氢受体数：
  6

反应信息

• 作为反应物：
  描述：

  sodium 4-(4'-methylphenylsulfonyloxy)benzenesulfonate 在 sodium hydroxide 、 五氯化磷 、 水 、 sodium acetate 、 potassium carbonate 、 三乙胺 、 sodium sulfite 作用下， 以 乙醇 、 水 、 甲苯 、 丁酮 、 正丁醇 为溶剂， 反应 109.0h， 生成 泛托法隆
  参考文献：
  名称：

  WO2007/103683

  摘要：

  公开号：
• 作为产物：
  描述：

  sodium p-hydroxybenzenesulfonate 、 对甲苯磺酰氯 在 sodium hydroxide 作用下， 以 水 为溶剂， 反应 2.5h， 生成 sodium 4-(4'-methylphenylsulfonyloxy)benzenesulfonate
  参考文献：
  名称：

  WO2007/103683

  摘要：

  公开号：

文献信息

• Alkyl- or aryl-aminoalkoxy-benzene-sulfonyl indoles
  申请人：Sanofi

  公开号：US04994474A1

  公开（公告）日：1991-02-19

  The present invention relates to aminoalkoxyphenyl derivatives of formula: ##STR1## and its N-oxide and pharmaceutically acceptable salts, in which: B represents a--S--, --SO-- or --SO.sub.2 -- group, R.sub.1 and R.sub.2, which are identical or different, each denote hydrogen, a methyl or ethyl radial or a halogen atom, A denotes a straight-or branched-alkylene radical having from 2 to 5 carbon atoms or a 2-hydroxypropylene radial in which the hydroxy is optionally substituted by a lower alkyl radical, R.sub.3 denotes an alkkyl radical or a radical of formula: --Alk--Ar in which Alk denotes a single bond or a linear- or branched-alkylene radical having from 1 to 5 carbon atoms and Ar denotes a pyridyl, phenyl, 2,3-methylenedioxyphenyl or 3,4-methylenedioxyphenyl radical or a phenyl group substituted with one or more substituents, which may be identical or different, selected from halogen atoms, lower alkyl group or lower alkoxy groups, R.sub.11 denotes hydrogen or a lower alkyl, phenyl, diphenylmethyl, benzyl or halogenobenzyl radical, R.sub.4 denotes hydrogen or an alkyl radical, or R.sub.3 and R.sub.4 when taken together denote an alkylene or alkenylene radical having from 3 to 6 carbon atoms and optionally substituted with a phenyl radical or optionally interrupted by ##STR2## R represent hydrogen, an alkyl radical, a cycloalkyl radical, a benzyl radical or a phenyl radical optionally substituted with one or more substituents, which may be identical or different, selected from halogen atoms and from lower alkyl, lower alkoxy or nitro groups, are described. The compounds of the invention possess exceptional pharmacological properties, especially calcium transport inhibitory properties, as well as bradycardic, hypotensive and antiadrenergic properties.

  本发明涉及公式的氨基烷氧基苯基衍生物：##STR1##及其N-氧化物和药学上可接受的盐，其中：B代表a--S--，--SO--或--SO.sub.2--基团，R.sub.1和R.sub.2，它们相同或不同，每个代表氢，甲基或乙基基团或卤原子，A代表具有2至5个碳原子的直链或支链烷基基团或2-羟基丙烯基团，其中羟基可选择地被较低的烷基基团取代，R.sub.3代表烷基基团或公式的基团：--Alk--Ar，其中Alk代表单键或具有1至5个碳原子的直链或支链烷基基团，Ar代表吡啶基，苯基，2,3-亚甲二氧基苯基或3,4-亚甲二氧基苯基基团或一个苯基基团，其被一个或多个取代基取代，这些取代基可以相同或不同，选自卤原子，较低烷基基团或较低烷氧基团，R.sub.11代表氢或较低烷基，苯基，二苯甲基，苄基或卤代苄基基团，R.sub.4代表氢或烷基基团，或当一起取时，R.sub.3和R.sub.4代表具有3至6个碳原子并且可选择地被苯基取代或可选择地被##STR2##中断的烷基或烯基基团，R代表氢，烷基基团，环烷基基团，苄基基团或苯基基团，可选择地被一个或多个取代基取代，这些取代基可以相同或不同，选自卤原子和较低烷基，较低烷氧基或硝基基团。本发明的化合物具有出色的药理学性能，特别是钙转运抑制性能，以及心动过缓，降压和抗肾上腺素性能。
• Aminoalkoxyphenyl derivatives, process of preparation and compositions
  申请人：Sanofi

  公开号：US05147878A1

  公开（公告）日：1992-09-15

  Aminoalkoxyphenyl derivatives useful in the treatment of certain pathological syndromes of the cardiovascular system of formula: ##STR1## in which: B represents a --S, --SO--, or --SO.sub.2 -- group, R.sub.1 and R.sub.2, which are identical or different, each denote hydrogen, a methyl or ethyl radical or a halogen such as chlorine, bromine or iodine, A denotes a straight- or branched-alkylene radical having from 2 to 5 carbon atoms or a 2-hydroxypropylene radical in which the hydroxy is optionally substituted by a lower alkyl radical, Ar represents a group ##STR2## R.sub.4 denotes hydrogen or an alkyl radical and Cy represents a cyclic group.

  氨基烷氧基苯基衍生物在治疗心血管系统某些病理综合征中有用，其化学式为：##STR1## 其中：B代表一个--S、--SO--或--SO.sub.2--基团，R.sub.1和R.sub.2，相同或不同，分别表示氢、甲基或乙基基团或氯、溴或碘等卤素，A表示具有2至5个碳原子的直链或支链烷基基团或2-羟基丙烯基基团，其中羟基可选择性地被较低的烷基基团取代，Ar代表一个基团##STR2## R.sub.4代表氢或烷基基团，Cy代表一个环状基团。
• Use of aminoalkoxyphenyl derivatives for reducing and/or controlling
  申请人：Sanofi

  公开号：US05017579A1

  公开（公告）日：1991-05-21

  The present invention is directed to the use of aminoalkoxyphenyl derivatives for reducing and/or controlling excessive intraocular pressure and compositions suitable for this case.

  本发明涉及使用氨基烷氧基苯基衍生物来降低和/或控制过高的眼内压力，以及适用于此情况的组合物。
• Photoacid generators, chemically amplified resist compositions, and patterning process
  申请人：——

  公开号：US20030215738A1

  公开（公告）日：2003-11-20

  Photoacid generators are provided by O-arylsulfonyl-oxime compounds having formula (1) wherein R is H, F, Cl, NO 2 , alkyl or alkoxy, n is 0 or 1, m is 1 or 2, r is 0 to 4, r′ is 0 to 5, k is 0 to 4, and G′ and G″ are S or —CH═CH—. Chemically amplified resist compositions comprising the photoacid generators have many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, and improved pattern profile after development. Because of high resolution, the compositions are suited for microfabrication, especially by deep UV lithography. 1

  提供光酸发生剂的是具有公式（1）的O-芳基磺酰基肟化合物，其中R为H，F，Cl，NO2，烷基或烷氧基，n为0或1，m为1或2，r为0至4，r'为0至5，k为0至4，G'和G"为S或—CH═CH—。包含光酸发生剂的化学增强型抗蚀剂组合物具有许多优点，包括改善分辨率、改善焦点宽度、即使在长期PED上也最小化线宽变化或形状退化，并且在显影后改善图案轮廓。由于具有高分辨率，这些组合物适用于微细制造，特别是通过深紫外光刻。
• Onium salts, photoacid generators for resist compositions, and patterning process
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：EP1077391A1

  公开（公告）日：2001-02-21

  Onium salts of the formula (1) are novel. R1 is C1-10 alkyl or C6-14 aryl, R2 is H or C1-6 alkyl, p is an integer of 1 to 5, q is an integer of 0 to 4, p+q = 5, R3 is C1-10 alkyl or C6-14 aryl, M is a sulfur or iodine atom, and "a" is equal to 3 or 2. A chemical amplification type resist composition comprising the onium salt as a photoacid generator is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution, minimized line width variation or shape degradation even on long-term PED, minimized defect after coating, development and stripping, and improved pattern profile after development.

  式（1）的铌盐是新颖的。 R1是C1-10烷基或C6-14芳基，R2是H或C1-6烷基，p是1至5的整数，q是0至4的整数，p+q=5，R3是C1-10烷基或C6-14芳基，M是硫或碘原子，"a "等于3或2。由作为光酸发生器的鎓盐组成的化学放大型抗蚀剂组合物适用于微细加工，特别是深紫外光刻，因为它具有许多优点，包括提高了分辨率，即使在长期的 PED 上也能最大限度地减少线宽变化或形状退化，最大限度地减少涂布、显影和剥离后的缺陷，以及改善显影后的图案轮廓。