4-hydroxy-2-hydroxymethylbenzimidazole

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 苯并咪唑类
• 英文名称: 4-hydroxy-2-hydroxymethylbenzimidazole
• 英文别名: 4-Hydroxy-2-(hydroxymethyl)benzimidazole；2-(hydroxymethyl)-1H-benzimidazol-4-ol
• 化学式: C₈H₈N₂O₂
• 分子量: 164.164
• InChiKey: KROOLBGYYVWEIA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.2
• 重原子数：
  12
• 可旋转键数：
  1
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.12
• 拓扑面积：
  69.1
• 氢给体数：
  3
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  2,3-二氨基苯酚 、 羟基乙酸 在 sodium hydroxide 作用下， 以 甲醇 为溶剂， 生成 4-hydroxy-2-hydroxymethylbenzimidazole
  参考文献：
  名称：

  Derivatives of benzimidazoles active as anti-ulcer agents

  摘要：

  通用公式I的新化合物，其制备方法，含有这种化合物作为活性成分的药物组合物以及这些化合物在医学中的用途。

  公开号：

  US05106862A1

文献信息

• Novel derivatives of benzimidazoles active as anti-ulcer agents
  申请人：Aktiebolaget Hässle

  公开号：EP0266326B1

  公开（公告）日：1993-03-10
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME
  申请人：FUJIFILM Corporation

  公开号：US20150004533A1

  公开（公告）日：2015-01-01

  An actinic ray-sensitive or radiation-sensitive resin composition in the present invention contains a nitrogen-containing compound (N) which is represented by the following general formula (N1): wherein, in the general formula (N1), X represents a group including a hetero atom; L represents a single bond or an alkylene group; R 2 represents a substituent, in the case where a plurality of R 2 's are present, they may be the same as or different from each other and a plurality of R 2 's may be bonded to each other to form a ring; R 3 represents a hydrogen atom or a substituent; and n represents an integer of 0 to 4.
• US5106862A
  申请人：——

  公开号：US5106862A

  公开（公告）日：1992-04-21
• US9323153B2
  申请人：——

  公开号：US9323153B2

  公开（公告）日：2016-04-26
• [EN] ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME<br/>[FR] COMPOSITION DE RÉSINE SENSIBLE AUX RAYONS ACTINIQUES OU SENSIBLE À LA RADIATION, ET FILM SENSIBLE AUX RAYONS ACTINIQUES OU SENSIBLE À LA RADIATION ET PROCÉDÉ DE FORMATION DE MOTIF, CHACUN L'UTILISANT
  申请人：FUJIFILM CORP

  公开号：WO2013147286A1

  公开（公告）日：2013-10-03

  An actinic ray-sensitive or radiation-sensitive resin composition in the present invention contains a nitrogen-containing compound (N) which is represented by the following general formula (N1):wherein, in the general formula (N1), X represents a group including a hetero atom; L represents a single bond or an alkylene group; R2 represents a substituent, in the case where a plurality of R2's are present, they may be the same as or different from each other and a plurality of R2's may be bonded to each other to form a ring;R3 represents a hydrogen atom or a substituent; and n represents an integer of 0 to 4.