Kinetics of metal oxide dissolution. Reductive dissolution of nickel ferrite by tris(picolinato)vanadium(II)
作者:Michael G. Segal、Robin M. Sellers
DOI:10.1039/f19827801149
日期:——
rate-determining step involves attack by V(pic)–3 on FeIII ions at the oxide surface. Dependences on [H+] and [free picolinate] are attributed to adsorption of these species at surface sites according to a simple model based on the Langmuir adsorption isotherm. Buffer and surfactant concentration had little effect. Some pitting etc. of the oxide surface occurs as the dissolution proceeds, although there appears
V(pic)– 3对NiFe 2 O 4的还原溶解进行了详细研究。反应动力学遵循立方速率定律,对[V II ]表现出一阶依赖性,表明速率确定步骤涉及V(pic)– 3对氧化物表面的Fe III离子的侵蚀。根据基于Langmuir吸附等温线的简单模型,对[H + ]和[游离吡啶甲酸]的依赖归因于这些物质在表面位置的吸附。缓冲液和表面活性剂的浓度影响很小。一些点蚀等尽管似乎也有一些一般的表面侵蚀,但随着溶解的进行,氧化物表面的表面会发生腐蚀。讨论了表面部位的性质以及溶解过程中的后续步骤。