1,2-diisopropyl-4,4,5,5-tetramethylbiguanidium 2-(3-benzoylphenyl)propionate

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1,2-diisopropyl-4,4,5,5-tetramethylbiguanidium 2-(3-benzoylphenyl)propionate
• 英文别名: 2-(3-benzoylphenyl)propanoate;[N-[bis(dimethylamino)methylidene]-N'-propan-2-ylcarbamimidoyl]-propan-2-ylazanium
• 化学式: C₁₂H₂₇N₅*C₁₆H₁₄O₃
• 分子量: 495.665
• InChiKey: QSZNJRZRSXHXSF-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.3
• 重原子数：
  36
• 可旋转键数：
  9
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.43
• 拓扑面积：
  99.9
• 氢给体数：
  2
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  四甲基胍 以 丙酮 为溶剂， 反应 2.17h， 生成 1,2-diisopropyl-4,4,5,5-tetramethylbiguanidium 2-(3-benzoylphenyl)propionate
  参考文献：
  名称：

  염기 발생제, 이 염기 발생제를 함유하는 염기 반응성 조성물 및 염기 발생 방법

  摘要：

  本发明旨在提供一种广泛用于有机溶剂中的高溶解度，可直接溶解环氧化合物等碱性反应性化合物，并具有高热稳定性和低核碱性性能的强碱生成剂，含有该碱生成剂和碱性反应性化合物的碱性反应性组合物，以及生成碱的方法。 本发明涉及一种以通式（A）表示的化合物，包括该化合物的碱生成剂，含有该碱生成剂和碱性反应性化合物的碱性反应性组合物，以及生成碱的方法等。（在上述式中，R～R分别独立地表示氢原子，烷基，取代基或含取代基的芳基或含取代基的芳基烷基，R表示氢原子，烷基，烯基，烷烃基，取代基或含取代基的芳基或含取代基的芳基烷基， R表示氢原子，氨基，烷基，取代基或含取代基的芳基或含取代基的芳基烷基，Z表示特定结构的羧酸衍生物的阴离子。）

  公开号：

  KR20160025587A

文献信息

• BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR
  申请人：WAKO PURE CHEMICAL INDUSTRIES, LTD.

  公开号：US20160340374A1

  公开（公告）日：2016-11-24

  An object of the present invention is to provide a compound which is capable of attaining a composition having high storage stability without reacting with a base-reactive compound, even in the case of storage for a long period of time in a mixed state with the base-reactive compound, such as an epoxy-based compound, as well as capable of generating a strong base (guanidines, biguanides, phosphazenes or phosphoniums) by irradiation of light (active energy rays) or heating; a base generator comprising the compound; and a base-reactive composition comprising the base generator and the base-reactive compound. The present invention relates to the compound represented by the general formula (A); the base generator comprising the compound; and the base-reactive composition comprising the base generator and the base-reactive compound. (wherein R 1 represents an alkyl group; an arylalkynyl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; an alkenyl group; a 2-furylethynyl group; a 2-thiophenylethynyl group; or a 2,6-dithianyl group; R 2 to R 4 each independently represent an alkyl group; an arylalkynyl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; the aryl group which may be substituted with a halogen atom, an alkyl group, an alkoxy group, or an alkylthio group; a furanyl group; a thienyl group; or an N-alkyl-substituted pyrrolyl group; Z + represents an ammonium cation having a guanidinium group, a biguanidium group or a phosphazenium group, or a phosphonium cation.)

  本发明的目的是提供一种化合物，能够在与碱反应性化合物混合状态长时间存储的情况下，仍能获得具有高储存稳定性的组合物，而不与碱反应性化合物发生反应，同时还能通过光照（活性能量射线）或加热产生强碱（胍胺、双胍胺、磷氮烷或磷銨）；包括该化合物的碱发生器；以及包括该碱发生器和碱反应性化合物的碱反应性组合物。本发明涉及由通式（A）表示的化合物；包括该化合物的碱发生器；以及包括该碱发生器和碱反应性化合物的碱反应性组合物。（其中R1代表烷基；可能被卤素原子、烷基、烷氧基或烷硫基取代的芳基炔基；烯基；2-呋喃基炔基；2-噻吩基炔基；或2,6-二硫基基；R2到R4各自独立地代表烷基；可能被卤素原子、烷基、烷氧基或烷硫基取代的芳基炔基；可能被卤素原子、烷基、烷氧基或烷硫基取代的芳基；呋喃基；噻吩基；或N-烷基取代的吡咯基；Z+代表具有胍胺基团、双胍胺基团或磷氮烷基团的铵阳离子，或磷銨阳离子。）
• BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD
  申请人：WAKO PURE CHEMICAL INDUSTRIES, LTD.

  公开号：US20160122292A1

  公开（公告）日：2016-05-05

  It is a subject of the present invention to provide a base generator which has high solubility to general-purpose organic solvents, can dissolve directly into a base-reactive compound, such as an epoxy-based compound, further is provided with both performance of high heat resistance and low nucleophilicity, and generates a strong base, a base-reactive composition comprising the base generator and a base-reactive compound, as well as a method for generating a base, etc. The present invention relates to a compound represented by the general formula (A), a base generator comprising the compound, a base-reactive composition which comprises the base generator and a base-reactive compound, as well as a method for generating a base, etc. (wherein R 1 to R 5 each independently represent a hydrogen atom; an alkyl group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, R 6 represents a hydrogen atom; an alkyl group which may have a substituent; an alkenyl group; an alkynyl group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, R 7 represents a hydrogen atom; an alkyl group which may have an amino group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, and Z − represents an anion derived from a carboxylic acid having a specific structure.)

  本发明的一个目的是提供一种基发生剂，其对通用有机溶剂具有高溶解度，可以直接溶解为一种碱反应性化合物，例如基于环氧树脂的化合物，进一步具有高耐热性和低亲核性的性能，并生成强碱，包括基发生剂和碱反应性化合物的碱反应性组合物，以及生成碱的方法等。本发明涉及一种由通式（A）表示的化合物，包括该化合物的基发生剂，包括基发生剂和碱反应性化合物的碱反应性组合物，以及生成碱的方法等。（其中R1至R5各自独立地表示氢原子；烷基基团；可能具有取代基的芳基团；或可能具有取代基的芳基烷基基团，R6表示氢原子；可能具有取代基的烷基基团；烯基基团；炔基基团；可能具有取代基的芳基团；或可能具有取代基的芳基烷基基团，R7表示氢原子；可能具有氨基的烷基基团；可能具有取代基的芳基团；或可能具有取代基的芳基烷基基团，Z-表示从具有特定结构的羧酸衍生的阴离子。）
• Compound, Photopolymerization Initiator Containing Said Compound, and Photosensitive Resin Composition Containing Said Photopolymerization Initiator
  申请人：Nippon Kayaku Kabushiki Kaisha

  公开号：US20200392079A1

  公开（公告）日：2020-12-17

  This compound which has excellent solvent solubility and compatibility with a resin, and which can generate bases and radicals with high efficiency by being irradiated with active energy rays, is represented by formula (1), where, in formula (1), R 1 , R 2 , R 3 , R 5 and R 6 represent a hydroxy group or an alkoxy group; the R 4 's independently represent an organic group containing a thioether bond; R 7 and R 9 independently represent a hydrogen atom or an alkyl group with 1 to 4 carbons; R 8 represents an alkylene group or an arylene group; and X represents an oxygen atom or a sulfur atom. A photopolymerization initiator can include said novel compound; and a photosensitive resin composition can include said photopolymerization initiator, from which a cured product can be obtained that has high sensitivity and no metal corrosion.

  这种化合物具有优异的溶剂溶解性和与树脂的兼容性，可以通过受到活性能量辐射而高效地产生碱基和自由基。该化合物由公式（1）表示，其中在公式（1）中，R1、R2、R3、R5和R6代表羟基或烷氧基；R4分别表示含硫醚键的有机基团；R7和R9分别代表氢原子或1至4个碳的烷基基团；R8代表烷基或芳基；X代表氧原子或硫原子。一种光聚合引发剂可以包括上述新化合物；一种光敏树脂组合物可以包括上述光聚合引发剂，从中可以得到高灵敏度且无金属腐蚀的固化产物。
• LONG-CHAIN ALKYLENE GROUP-CONTAINING EPOXY RESIN COMPOSITION
  申请人：Nissan Chemical Corporation

  公开号：EP3375804A1

  公开（公告）日：2018-09-19

  There is provided an epoxy resin composition containing an epoxy compound, which has a low viscosity and a low dielectric constant, and when added to a general-purpose epoxy resin composition, can lower a viscosity of the composition and can sufficiently lower a dielectric constant of an epoxy resin cured product obtained from the composition. An epoxy resin composition comprising: (a) an epoxy component containing at least an epoxy compound of formula [1]; and (b) a curing agent: wherein R1 to R3 each independently are a hydrogen atom or methyl group, and L1 to L3 each independently are pentamethylene group, hexamethylene group or heptamethylene group.

  提供了一种含有环氧化合物的环氧树脂组合物，该环氧化合物具有低粘度和低介电常数，当添加到通用环氧树脂组合物中时，可降低组合物的粘度，并可充分降低由该组合物固化的环氧树脂产品的介电常数。一种环氧树脂组合物，包括：(a) 至少含有式[1]环氧化合物的环氧组分；(b) 固化剂： 其中 R1 至 R3 各自独立地为氢原子或甲基，L1 至 L3 各自独立地为五亚甲基、六亚甲基或七亚甲基。
• Curable composition including siloxane oligomer and inorganic fine particles
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US10125267B2

  公开（公告）日：2018-11-13

  A material having a low refractive index that exhibits sufficiently low refractive index without deteriorating the strength of cured film produced therefrom, that can be cured by an active energy ray that is applicable for a resin base material that is not desired to be exposed to heat. Curable composition including: siloxane oligomer (a) containing a radically polymerizable double bond obtained through hydrolysis and condensation of alkoxysilanes containing at least an alkoxysilane A of Formula [1] and alkoxysilane B of Formula [2] in an amount of 100 parts by mass; inorganic fine particles (b) in amount of 10 parts by mass to 1,000 parts by mass; polymerization initiator (c) generating a radical upon active energy ray irradiation in an amount of 0.1 parts by mass to 25 parts by mass R1aSi(OR2)4-a  [1] R3bSi(OR4)4-b  [2] a cured film produced from the composition, and a laminate including a low refractive index layer produced from the composition.

  一种具有低折射率的材料，该材料具有足够低的折射率，且不会降低由其制成的固化膜的强度，可通过活性能量射线固化，适用于不希望受热的树脂基材料。可固化组合物，包括：硅氧烷低聚物 (a)，其中含有通过水解和缩合至少含有式 [1] 烷氧基硅烷 A 和式 [2] 烷氧基硅烷 B 的烷氧基硅烷而获得的可辐射聚合双键，其用量为 100 份（按质量计）；无机微粒 (b)，其用量为 10 份（按质量计）至 1 000 份（按质量计）；聚合引发剂 (c)，其用量为 0.1 份（按质量计）至 25 份（按质量计）。 R1aSi(OR2)4-a [1] R3bSi(OR4)4-b [2] 由该组合物制成的固化薄膜，以及包括由该组合物制成的低折射率层的层压板。