申请人:Ciba Specialty Chemicals Corporation
公开号:US06596445B1
公开(公告)日:2003-07-22
Oximeester compounds of the formulae I, II, III and IV
wherein
R1 is phenyl, C1-C20alkyl or C2-C20alkyl optionally interrupted by —O—, C2-C20alkanoyl or benzoyl, or R1 is C2-C12alkoxycarbonyl or phenoxycarbonyl; R1′ is C2-C12alkoxycarbonyl, or R1′ is phenoxycarbonyl, or R1′ is —CONR10R11 or CN; R2 is C2-C12alkanoyl, C4-C6alkenoyl, benzoyl, C2-C6alkoxycarbonyl or phenoxycarbonyl; R3, R4, R5, R6 and R7 are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl or a group OR8, SR9, SOR9, SO2R9 or NR10R11; R4′, R5′ and R6′ are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12-alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl, or are a group OR8, SR9, SOR9, SO2R9, NR10R11; provided that at least one of R3, R4, R5, R6, R7, R′4, R′5 and R′6 is OR8, SR9 or NR10R11; R8, R9, R10 and R11 are for example hydrogen, C1-C12alkyl, phenyl; are suitable as initiators for the photopolymerization of radically polymerizable compounds.
氧肟化合物的公式I、II、III和IV,其中R1是苯基、C1-C20烷基或C2-C20烷基,可选地由—O—、C2-C20烷酰基或苯甲酰基中断,或者R1是C2-C12烷氧羰基或苯氧羰基;R1'是C2-C12烷氧羰基,或者R1'是苯氧羰基,或者R1'是—CONR10R11或CN;R2是C2-C12烷酰基、C4-C6烯酰基、苯甲酰基、C2-C6烷氧羰基或苯氧羰基;R3、R4、R5、R6和R7是氢、卤素、C1-C12烷基、环戊基、环己基、苯基、苄基、苯甲酰基、C2-C12烷酰基、C2-C12烷氧羰基、苯氧羰基或者一个OR8、SR9、SOR9、SO2R9或NR10R11基团;R4'、R5'和R6'是氢、卤素、C1-C12烷基、环戊基、环己基、苯基、苄基、苯甲酰基、C2-C12烷酰基、C2-C12烷氧羰基、苯氧羰基,或者是一个OR8、SR9、SOR9、SO2R9、NR10R11基团;但至少其中一个R3、R4、R5、R6、R7、R'4、R'5和R'6是OR8、SR9或NR10R11;R8、R9、R10和R11例如是氢、C1-C12烷基、苯基;适用作为引发剂用于自由基聚合可聚合化合物的光聚合。