CHAIN SCISSION POLYESTER POLYMERS FOR PHOTORESISTS
申请人:Brainard Robert L.
公开号:US20110127651A1
公开(公告)日:2011-06-02
Polymers for extreme ultraviolet and 193 nm photoresists are disclosed. The polymers comprise a photoacid generator (PAG) residue, an acid cleavable residue and a diacid joined by ester linkages. The polymers include a photoacid generating diol, a diacid and an acid table diol.
A practical synthesis of substituted 2,6-diaminopyridines via microwave-assisted copper-catalyzed amination of halopyridines
作者:Matthias Mastalir、Egon E. Rosenberg、Karl Kirchner
DOI:10.1016/j.tet.2015.08.042
日期:2015.10
selective substitution of one or two halogens by aryl or alkylamines was achieved within 2–6 h with temperatures between 80 and 225 °C affording 2,6-diaminopyridines in good to excellent isolated yields. The reaction allows easy variation between educts and different N-substitutions. The target compounds are valuable precursors for the synthesis of bis-phosphorylated 2,6-diaminopyridines which are