N-{1,1-difluoro-2-(bicyclo[2.2.1]heptan-2-yl)ethansulfonyloxy}bicyclo[2.2.1]hept-5-ene-2,3-dicarboxyimide

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 异吲哚及其衍生物
• 英文名称: N-{1,1-difluoro-2-(bicyclo[2.2.1]heptan-2-yl)ethansulfonyloxy}bicyclo[2.2.1]hept-5-ene-2,3-dicarboxyimide
• 英文别名: (3,5-Dioxo-4-azatricyclo[5.2.1.02,6]dec-8-en-4-yl) 2-(2-bicyclo[2.2.1]heptanyl)-1,1-difluoroethanesulfonate
• 化学式: C₁₈H₂₁F₂NO₅S
• 分子量: 401.431
• InChiKey: CELUJSNDEILNEU-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.5
• 重原子数：
  27
• 可旋转键数：
  5
• 环数：
  5.0
• sp3杂化的碳原子比例：
  0.78
• 拓扑面积：
  89.1
• 氢给体数：
  0
• 氢受体数：
  7

反应信息

• 作为产物：
  描述：

  1,1-difluoro-2-(bicyclo[2.2.1]heptan-2-yl)ethane sulfonylchloride 、 N-羟基-5-降冰片烯-2,3-二甲酰亚胺 在 三乙胺 作用下， 以 丙酮 为溶剂， 反应 5.0h， 生成 N-{1,1-difluoro-2-(bicyclo[2.2.1]heptan-2-yl)ethansulfonyloxy}bicyclo[2.2.1]hept-5-ene-2,3-dicarboxyimide
  参考文献：
  名称：

  EP1600437

  摘要：

  公开号：

文献信息

• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
  申请人：YAMAGUCHI Shuhei

  公开号：US20100183980A1

  公开（公告）日：2010-07-22

  An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (B) a resin capable of increasing a dissolution rate of the resin (B) in an alkali developer by an action of an acid, the resin (B) containing a specific repeating unit having a lactone structure; and (D) a low molecular compound having a group capable of leaving by an action of an acid, and a pattern forming method uses the composition.
• ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN
  申请人：FUJIFILM CORPORATION

  公开号：US20140227636A1

  公开（公告）日：2014-08-14

  Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (Aa) containing at least one repeating unit (Aa1) derived from monomers of general formula (aa1-1) below and at least one repeating unit (Aa2) derived from monomers of general formula (aa2-1) below and comprising a resin (Ab) that when acted on by an acid, changes its alkali solubility.
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME
  申请人：FUJIFILM Corporation

  公开号：US20140295332A1

  公开（公告）日：2014-10-02

  An actinic ray-sensitive or radiation-sensitive resin composition, which is excellent in sensitivity, resolution, a pattern profile and a depth of focus (DOF), and, an actinic ray-sensitive or radiation-sensitive film and a pattern forming method, each using the same, are provided. The actinic ray-sensitive or radiation-sensitive resin composition includes a nitrogen-containing compound and a resin (Ab) capable of varying a polarity or an alkali solubility thereof by the action of an acid.
• US20140272692A1
  申请人：——

  公开号：US20140272692A1

  公开（公告）日：2014-09-18
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20150010857A1

  公开（公告）日：2015-01-08

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit represented by the following Formula (A) and having at least two of a repeating unit represented by the following Formula (B), a repeating unit represented by the following Formula (C), a repeating unit represented by the following Formula (D) and a repeating unit represented by the following Formula (E).