Thiol–ene photopolymerization of vinyl-functionalized metal–organic frameworks towards mixed-matrix membranes
作者:Chinnadurai Satheeshkumar、Hyun Jung Yu、Hyojin Park、Min Kim、Jong Suk Lee、Myungeun Seo
DOI:10.1039/c8ta03803a
日期:——
synthesized from 2-vinyl-1,4-dicarboxylic acid with ZrCl4, and a free-standing MMM was readily produced by irradiation of a polymerization mixture containing UiO-66-CHCH2, poly(ethylene glycol) divinyl ether (PEO-250), pentaerythritol tetra(3-mercaptopropionate) (PETM), 2,2′-(ethylenedioxy)diethanethiol (EDDT), and 2,2-dimethoxy-2-phenylacetophenone (DMPA) as a photoradical initiator. Assorted analyses combining
我们开发了一种简便的方法来制造独立的混合基质膜(MMM),该膜通过利用硫醇-烯光聚合和由乙烯基官能团组成的MOF来包含共价掺入高达60 wt%的金属-有机骨架(MOF)颗粒。用ZrCl 4由2-乙烯基-1,4-二羧酸合成乙烯基官能化的UiO-66(UiO-66-CH CH 2),并通过辐照含有UiO- 66通道CH 2,聚乙二醇二乙烯基醚(PEO-250),季戊四醇四(3-巯基丙酸酯)(PETM),2,2'-(乙二氧基)二乙硫醇(EDDT)和2,2-二甲氧基-2-苯基苯乙酮(DMPA) )作为光自由基引发剂。结合了FTIR,热重分析,扫描电子显微镜,能量色散X射线光谱和X射线衍射的各种分析结果有力地证明了C–成功地制备了所需的包含良好分散的UiO-66-CH CH 2粒子的MMM。S键形成,这提供了MOF与聚合物基质的强结合,而没有界面空隙。与原始聚合物膜相比,所生产的MMM具有很高的柔韧