A photosensitive polymer construction comprising (A) a poly (amic acid), (B) a compound or a mixture of compounds which can form a compound having two or more amino groups in the molecule, and (C) at least one compound having a boiling point of 150°C or higher at atmospheric pressure and selected from the group consisting of
wherein Ra, Rb, Rc, m and n are as defined in the specification, has good properties and does not produce cracks on a pattern at the time of development obtained from said composition.
一种光敏聚合物结构,包括(A)聚(胺基酸);(B)一种化合物或化合物混合物,可形成分子中含有两个或两个以上
氨基的化合物;和(C)至少一种化合物,在常压下沸点为 150℃或更高,并选自以下组成的组 其中 Ra、Rb、Rc、m 和 n 如说明书中所定义,具有良好的性能,并且在从所述组合物中获得显影图案时不会产生裂纹。