作者:Bruno Haché、Yves Gareau
DOI:10.1016/s0040-4039(00)73174-1
日期:1994.3
The triphenylsilythiyl radical generated thermally (AIBN) or photochemically in the presence of an olefin yields the anti-Markovnikov H2S adduct after deprotection by trifluoroacetic acid (TFA).
在烯烃存在下,通过热(AIBN)或光化学方式生成的三苯基甲硅烷基可在三氟乙酸(TFA)脱保护后生成抗马尔可夫尼科夫H 2 S加合物。