申请人:Ciba Specialty Chemicals Corporation
公开号:US06485886B1
公开(公告)日:2002-11-26
New oxime derivatives of formula (I) or. (II), wherein m is 0 or 1; R1 inter alia is phenyl, naphthyl, anthracyl, phenanthryl or a heteroaryl radical; R′1 is for example C2-C12alkylene, phenylene, naphthylene; R2 is CN; R3 is C2-C6haloalkanoyl, halobenzoyl, a phosphoryl or an organosilyl group; R4, R5, R10 and R11 inter alia are hydrogen, C1-C6alkyl, C1-C6alkoxy; R6 inter alia is hydrogen phenyl, C1-C12alkyl; R7 and R8 inter alia are hydrogen, C1-C12alkyl; or R7 and R8, together with the nitrogen atom to which they are bonded, form a 5-, 6 or 7-membered ring; R9 is for example C1-C12alkyl; and A inter alia is S, O, NR7a; are useful as latent acids, especially in photoresist applications.
式(I)或(II)的新羟肟衍生物,其中m为0或1;R1等为苯基、萘基、蒽基、菲基或杂环芳基;R′1例如为C2-C12烷基、苯基、萘基;R2为CN;R3为C2-C6卤代烷酰基、卤代苯甲酰基、磷酰基或有机硅基;R4、R5、R10和R11等为氢、C1-C6烷基、C1-C6烷氧基;R6等为氢、苯基、C1-C12烷基;R7和R8等为氢、C1-C12烷基;或者R7和R8与它们连接的氮原子一起形成5、6或7元环;R9例如为C1-C12烷基;A等为硫、氧、NR7a等;在光刻胶应用中作为潜在酸是有用的。