申请人:NISSAN CHEMICAL CORPORATION
公开号:US11287741B2
公开(公告)日:2022-03-29
A composition for forming a resist underlayer film that functions as an anti-reflective coating during exposure and can be embedded in a recess having a narrow space and a high aspect ratio, and has excellent resistance to an aqueous hydrogen peroxide solution. A resist underlayer film-forming composition containing a resin, a compound of the following Formula (1a) or (1b):
wherein X is carbonyl group or methylene group, 1 and m are each independently an integer of 0 to 5 and satisfy a relational expression of 3≤1+m 10, and n is an integer of 2 to 5, and a solvent, wherein the compound of Formula (1a) or (1b) is contained in an amount of 0.01% by mass to 60% by mass relative to the amount of the resin.
一种用于形成抗蚀剂底层膜的组合物,该抗蚀剂底层膜在曝光时可用作抗反射涂层,并可嵌入具有窄空间和高长宽比的凹槽中,而且对过氧化氢水溶液具有优异的耐受性。抗蚀剂底层成膜组合物含有树脂、下式(1a)或(1b)的化合物:
其中 X 是羰基或亚甲基,1 和 m 各自独立地为 0 至 5 的整数,且满足 3≤1+m 10 的关系式,n 是 2 至 5 的整数,以及溶剂,其中式 (1a) 或 (1b) 化合物的含量为树脂含量的 0.01% 至 60%。