3-mono- and 3,5-disubstituted-4-acetoxy and -4-hydroxystyrenes and process for their production
申请人:HOECHST AKTIENGESELLSCHAFT
公开号:EP0307751A2
公开(公告)日:1989-03-22
The invention relates to 3-mono- and 3,5-disubstituted-4-acetoxy- and -4-hydroxystyrenes, wherein said substitutes are independently C₁ and C₁₀ alkyl, C₁-C₁₀) alkoxy, amino, or halogen, (Br, I, Cl), NO₂ or SO₃H, The compounds of this invention find use as intermediates of polymers, which are useful as improved binder resins for photoresists.
In particular those polymers, having as substitutes at least one halogen, are useful as radiation-sensitive compounds in corresponding photoresists.
Thus, the invention further relates to a process for production of said styrene derivatives.
本发明涉及 3-单-和 3,5-二取代-4-乙酰氧基-和-4-羟基苯乙烯,其中所述取代基独立地为 C₁ 和 C₁₀ 烷基、C₁-C₁₀烷氧基、氨基或卤素(Br、I、Cl)、NO₂ 或 SO₃H、本发明的化合物可用作聚合物的中间体,这些聚合物可用作光刻胶的改良粘结树脂。
特别是那些至少有一种卤素作为替代物的聚合物,在相应的光刻胶中可用作辐射敏感化合物。
因此,本发明还涉及一种生产上述苯乙烯衍生物的工艺。