1-(4H-呋喃并[3,2-b]吡咯-4-基)乙酮 | 114810-50-3

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 呋喃吡咯
• 中文名称: 1-(4H-呋喃并[3,2-b]吡咯-4-基)乙酮
• 中文别名: 4H-呋喃并[3,2-b]吡咯,4-乙酰基-(9CI)
• 英文名称: 4-acetylfuro<3,2-b>pyrrole
• 英文别名: 1-(4H-Furo[3,2-b]pyrrol-4-yl)ethanone；1-furo[3,2-b]pyrrol-4-ylethanone
• CAS: 114810-50-3
• 化学式: C₈H₇NO₂
• 分子量: 149.149
• InChiKey: LLDKTFHAZYSWOM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1
• 重原子数：
  11
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.12
• 拓扑面积：
  35.1
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  1-(4H-呋喃并[3,2-b]吡咯-4-基)乙酮 在 sodium hydroxide 作用下， 以 乙醇 为溶剂， 反应 0.33h， 以70%的产率得到4H-呋喃并[3,2-b]吡咯
  参考文献：
  名称：

  Krutosikova, Alzbeta; Dandarova, Miloslava; Alfoeldi, Juraj, Collection of Czechoslovak Chemical Communications, 1988, vol. 53, # 8, p. 1770 - 1778

  摘要：

  DOI：
• 作为产物：
  描述：

  呋喃并吡咯甲酸 、 乙酸酐 生成 1-(4H-呋喃并[3,2-b]吡咯-4-基)乙酮
  参考文献：
  名称：

  摘要：

  DOI：

文献信息

• Substituted 4-Benzylfuro[3,2-b]pyrroles
  作者：Alžbeta Krutošíková、Mikuláš Hanes

  DOI：10.1135/cccc19921487

  日期：——

  Preparation of 4-benzylfuro[3,2-b]pyrroles is described and their reactions with selected dienophiles are discussed. Utilization of 4-acetylfuro[3,2-b]pyrroles for preparation of 4-substituted derivatives of furo[3,2-b]pyrrole and the synthesis of ethyl 4-(2- and 4-nitrobenzyl)furo[3,2-b]pyrrole-5-carboxylates for fusing to a 1,4-diazepine system is presented.

  本文介绍了制备4-苄基呋喃[3,2-b]吡咯的方法，并讨论了它们与选择性双烯丙烃的反应。利用4-乙酰基呋喃[3,2-b]吡咯制备呋喃[3,2-b]吡咯的4-取代衍生物，以及合成乙酸乙酯基4-(2-和4-硝基苄基)呋喃[3,2-b]吡咯-5-羧酸酯，用于与1,4-二氮杂环系统融合。
• KRUTOSIKOVA, A.;KRALOVICOVA, E.;DANDAROVA, M.;KELEMEN, P., CHEM. PAP., 42,(1988) N 1, 89-95
  作者：KRUTOSIKOVA, A.、KRALOVICOVA, E.、DANDAROVA, M.、KELEMEN, P.

  DOI：——

  日期：——
• ——
  作者：KRUTOSIKOVA A.、 KELEMEN P.

  DOI：——

  日期：——
• TREATING SOLUTION FOR ELECTRONIC PARTS, AND PROCESS FOR PRODUCING ELECTRONIC PARTS
  申请人：FINE POLYMERS CORPORATION

  公开号：US20150279654A1

  公开（公告）日：2015-10-01

  The invention provides an aqueous solution capable of selectively protecting a nitrogen-containing silicon compound from corrosion by a treating solution for etching, cleaning or the like, etching oxygen-containing, carbon-containing silicon in particular, and making a large etch rate difference between a nitrogen-containing silicon compound and an oxygen-containing silicon compound, and a process for producing electronic parts as well. The invention is embodied by a treating solution for electronic parts that is an aqueous solution containing one or two or more of anionic surface active agents represented by the following formulae (1), (2) and (3), and a process for producing an electronic part. wherein R 1 , R 2 , and R 3 stands for hydrogen or an alkyl or alkylene group having 1 to 4 carbon atoms, and X 1 stands for a functional group capable of becoming an anionic ion. wherein R 4 stands for hydrogen or an alkyl or alkylene group having 1 to 4 carbon atoms, X 2 stands for a functional group capable of becoming an anionic ion, and n stands for a natural number of greater than 2. wherein R 5 stands for hydrogen or an alkyl or alkylene group having 1 to 4 carbon atoms, and X 3 , and X 4 stands for a functional group capable of becoming an anionic ion.
• US9812315B2
  申请人：——

  公开号：US9812315B2

  公开（公告）日：2017-11-07

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