An etchant composition includes a silane compound represented by the following Chemical Formula 1:
wherein R
1
to R
6
are independently hydrogen, halogen, a substituted or unsubstituted C
1
-C
20
hydrocarbyl group, a phenyl group, a C
1
-C
20
alkoxy group, a carboxy group, a carbonyl group, a nitro group, a tri (C
1
-C
20
) alkylsilyl group, a phosphoryl group, or a cyano group, L is a direct bond or C
1
-C
3
hydrocarbylene, A is an n-valent radical, and n is an integer of 1 to 4.
一种蚀刻组合物包括以下
化学式1所代表的
硅烷化合物:其中R1至R6独立地表示
氢、卤素、取代或未取代的C1-C20烃基、
苯基、C1-C20烷
氧基、羧基、羰基、硝基、三(C1-C20)烷基
硅基、
磷酰基或
氰基,L是直接键或C1-C3烃基亚基,A是n价基团,n为1至4的整数。