2,5-二羟基-1-甲氧基蒽醌 | 34425-63-3

• 分子结构分类: 有机化合物 - 苯类化合物 - 蒽
• 中文名称: 2,5-二羟基-1-甲氧基蒽醌
• 英文名称: 5(8)-hydroxyalizarin-1-methylether
• 英文别名: 2,5-Dihydroxy-1-methoxyanthracene-9,10-dione
• CAS: 34425-63-3
• 化学式: C₁₅H₁₀O₅
• 分子量: 270.241
• InChiKey: PIYPSEKICNYSKT-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.7
• 重原子数：
  20
• 可旋转键数：
  1
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.07
• 拓扑面积：
  83.8
• 氢给体数：
  2
• 氢受体数：
  5

反应信息

• 作为产物：
  描述：

  (4S,4aS,9aR)-4a,9a-Dichloro-5-hydroxy-4-methoxy-3,4,4a,9a-tetrahydro-1H-anthracene-2,9,10-trione 在 sodium methylate 作用下， 以 甲醇 为溶剂， 以95%的产率得到2,5-二羟基-1-甲氧基蒽醌
  参考文献：
  名称：

  Dichloro quinones as dienophiles: synthesis of alizarin derivatives

  摘要：

  DOI：

  10.1016/s0040-4039(01)93478-1

文献信息

• METHOD FOR MANUFACTURING SUBSTRATE AND METHOD FOR MANUFACTURING LIGHT EMITTING ELEMENT USING SAME
  申请人：Toray Industries, Inc.

  公开号：EP3369780A1

  公开（公告）日：2018-09-05

  The present invention provides a method of producing a substrate on the surface of which the curved surface pattern is carved, using a resin composition that can afford a cured film which can be formed into a resist pattern in curved surface shape, which does not cause resist burning and carbonization even in high-output dry etching processing subject to a high temperature, and which has good etching selectivity and post-etching removability. The present invention is a method of producing a patterned substrate, the method including the steps of: providing, on a substrate, a coating film of a resin composition including (A) an alkali-soluble resin selected from the group consisting of polyimides, polyamideimides, polyimide precursors, polyamideimide precursors, polybenzoxazoles, polybenzoxazole precursors, copolymers of at least two of the resins, and copolymers of at least one of the resins and another structural unit, (B) a photoacid generator, and (C) at least one compound selected from the group consisting of epoxy compounds and oxetane compounds; forming a pattern of the coating film; patterning the substrate through etching using the pattern of the coating film as a mask; and removing the coating film of the resin composition.

  本发明提供了一种在其表面雕刻弧形表面图案的基板的生产方法，该方法使用的树脂组合物可以提供一种固化膜，该固化膜可以形成弧形表面形状的抗蚀剂图案，即使在高温的高输出干蚀刻加工中也不会导致抗蚀剂烧焦和碳化，并且具有良好的蚀刻选择性和蚀刻后可去除性。本发明是一种生产图案化基板的方法，该方法包括以下步骤：在基底上提供一层树脂组合物的涂膜，该树脂组合物包括 (A) 碱溶性树脂，该树脂选自由以下组成的组(A) 至少两种树脂的共聚物，以及至少一种树脂和另一种结构单元的共聚物； (B) 光酸发生器；以及 (C) 至少一种选自由环氧化合物和氧杂环丁烷化合物组成的组中的化合物；形成涂膜图案；使用涂膜图案作为掩膜，通过蚀刻对基底进行图案化；以及去除树脂组合物的涂膜。
• Method for manufacturing substrate and method for manufacturing light emitting element using same
  申请人：TORAY INDUSTRIES, INC.

  公开号：US10418521B2

  公开（公告）日：2019-09-17

  A method of producing a patterned substrate includes the steps of: providing, on a substrate, a coating film of a resin composition including (A) an alkali-soluble resin selected from the group consisting of polyimides, polyamideimides, polyimide precursors, polyamideimide precursors, polybenzoxazoles, polybenzoxazole precursors, copolymers of at least two of the resins, and copolymers of at least one of the resins and another structural unit, (B) a photoacid generator, and (C) at least one compound selected from the group consisting of epoxy compounds and oxetane compounds; forming a pattern of the coating film; patterning the substrate through etching using the pattern of the coating film as a mask; and removing the coating film of the resin composition.

  一种生产图案化基底的方法包括以下步骤在基底上提供一层树脂组合物涂膜，该树脂组合物包括 (A) 碱溶性树脂，该树脂选自由聚酰亚胺、聚酰胺酰亚胺、聚酰亚胺前体、聚酰胺酰亚胺前体、聚苯并恶唑、聚苯并恶唑前体、至少两种树脂的共聚物和至少一种树脂与另一结构单元的共聚物组成的组(A) 至少两种树脂的共聚物，以及至少一种树脂和另一种结构单元的共聚物； (B) 光酸发生器；以及 (C) 至少一种选自由环氧化合物和氧杂环丁烷化合物组成的组中的化合物；形成涂膜图案；使用涂膜图案作为掩膜，通过蚀刻对基底进行图案化；以及去除树脂组合物的涂膜。
• RESIN COMPOSITION, METHOD FOR PRODUCING HEAT-RESISTANT RESIN FILM, AND DISPLAY DEVICE
  申请人：TORAY INDUSTRIES, INC.

  公开号：US20170299965A1

  公开（公告）日：2017-10-19

  A resin composition which is configured such that if the resin composition is formed into a resin composition film that has a thickness of 3.0 μm after a heat treatment at a temperature within the range of 200-350° C., the resin composition film forms a heat-resistant resin film that has a light transmittance of 50% or more at a wavelength of 365-436 nm before the heat treatment, while having a light transmittance of 10% or less at a wavelength of 365-436 nm after the heat treatment. Provided is a resin composition having a function of absorbing ultraviolet light and visible light in a short wavelength range, which is suitable for the formation of a planarization film, an insulating layer and a partition wall that are used for organic light emitting devices or display devices.
• Dichloro quinones as dienophiles: synthesis of alizarin derivatives
  作者：Donald W. Cameron、Geoffrey I. Feutrill、Philip L.C. Keep

  DOI：10.1016/s0040-4039(01)93478-1

  日期：——